A method of forming a porous sol gel, including a dried porous sol gel, is provided comprising forming a sol gel from a sol gel-forming composition comprising a silane solution and a catalyst solution; and non-supercritically drying the sol gel to provide a dried porous sol gel having no springback. The dried porous sol gel can include dried macroporous or mesoporous sol gels or dried hybrid aerogels. The materials may contain open or filled pores. Such materials are useful as thermal insulators.

A method of forming a porous sol gel, including a dried porous sol gel, is provided comprising forming a sol gel from a sol gel-forming composition comprising a silane solution and a catalyst solution; and non-supercritically drying the sol gel to provide a dried porous sol gel having no springback. The dried porous sol gel can include dried macroporous or mesoporous sol gels or dried hybrid aerogels. The materials may contain open or filled pores. Such materials are useful as thermal insulators.

An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability. The present invention relates to a silica particle in which a proportion of silanol groups present on a surface represented by (x/y)×100% is 15% or less, where a content of silanol groups on the surface is x mass % and a content of bulk silanol groups is y mass %.

An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol.

Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y≥4.2 where a d value measured by wide-angle X-ray scattering is y ∪.

A tunable one-pot method for producing nanoparticles for plant defense and growth enhancement that include components that collectively exhibit multiple release profiles of active ingredients when exposed to release conditions, such as contact with water, or sufficient moisture, or changes in pH, or the presence of plant roots. In a preferred embodiment, the method produces round or substantially round amorphous hydroxylated (and thus water soluble and low toxicity) nanoparticles having i) a silica-based core that exhibits a slow release rate and ii) silica mono- and/or oligomer based nanodomains and/or one or more active ingredients associated with the core, entrapped in nanopores or nanodomains, and/or adsorbed to the surface, etc., that exhibit at least a second, faster release rate under release conditions, wherein the active ingredient includes one or more of a silica monomer and/or oligomer and/or additional active ingredients such as a pesticide, nutrient, prebiotic, or phytostimulant Methods for producing nanoparticles for agricultural use are disclosed, including colloidal synthesis steps that provide precise, tunable control of the architecture of the nanoparticles. Advantageously, the nanoparticles resulting from this process are suitable for use as plant growth and defense enhancers through delivery of the silica mono- and/or oligomers and/or active ingredients, by hormesis/plant nanopriming, or by mixture with conventional agrochemicals.

The present invention relates to a method for manufacturing an aerogel blanket, the method including 1) introducing a catalyzed sol and a substrate for a blanket into a reaction vessel to impregnate the catalyzed sol into the substrate for a blanket, and 2) rotating the substrate for a blanket into which the catalyzed sol is impregnated to perform gelation, wherein the catalyzed sol includes a silica precursor composition, and the silica precursor composition includes a silicate containing a hydrophobic group and a tetraalkyl silicate, wherein a molar ratio of the silicate containing a hydrophobic group and the tetraalkyl silicate is 60:40 to 98:2.

The present invention provides colloidal silica containing silica particles excellent in compactness and excellent in maintenance of the bumpy surface under basic conditions, and provides a method for producing the colloidal silica. The present invention provides colloidal silica containing silica particles having a bumpy surface, wherein (1) the silica particles have a content of alkoxy groups of 1000 ppm or more, and (2) the silica particles have a reduction in specific surface area of 15.0% or less when the silica particles are heated under basic conditions.

The present invention provides colloidal silica containing silica particles excellent in compactness and excellent in maintenance of the bumpy surface under basic conditions, and provides a method for producing the colloidal silica. The present invention provides colloidal silica containing silica particles having a bumpy surface, wherein (1) the silica particles have a content of alkoxy groups of 1000 ppm or more, and (2) the silica particles have a reduction in specific surface area of 15.0% or less when the silica particles are heated under basic conditions.

The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.

The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.