A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.

A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.

The present application provides a heat exchanger and a manufacturing method of a heat exchanger. The heat exchange includes a metal substrate having a fluid channel for circulating a heat exchange medium. The heat exchanger includes a coating having a rare earth conversion coating and a hydrophilic coating. The rare earth conversion coating is arranged to cover at least part of a surface of the metal substrate, and the rare earth conversion coating includes a rare earth element-containing compound. At least part of the hydrophilic coating is further away from the metal substrate than the rare earth conversion coating. A surface of the heat exchanger is hydrophilic, which is conducive to the discharge of condensate water, and can improve corrosion resistance and prolong a service life of the heat exchanger.

Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce.sup.3+ and Ce.sup.4+. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ce.sup.3+ on the cerium oxide surface.

Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce.sup.3+ and Ce.sup.4+. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ce.sup.3+ on the cerium oxide surface.

The present invention is directed to nanoporous cerium oxide nanoparticle (NCeONP) macro-structures in polymeric elastomers. Such macrostructures can be used to modify the mechanical properties of the polymeric elastomer and influence the response to UV exposure.

The present invention is directed to nanoporous cerium oxide nanoparticle (NCeONP) macro-structures in polymeric elastomers. Such macrostructures can be used to modify the mechanical properties of the polymeric elastomer and influence the response to UV exposure.

A composition comprising glass containing both trivalent cerium oxide and tetravalent cerium oxide states nano particles. A soluble sodium borate glass comprising cerium oxide that is stable against crystallizations, the cerium oxide comprising both trivalent Ce.sup.3+ (Ce.sub.2O.sub.3) and tetravalent Ce.sup.4+ (CeO.sub.2) states, wherein the cerium oxide nano particles are configured to be released when the glass is dissolved.

A composition comprising glass containing both trivalent cerium oxide and tetravalent cerium oxide states nano particles. A soluble sodium borate glass comprising cerium oxide that is stable against crystallizations, the cerium oxide comprising both trivalent Ce.sup.3+ (Ce.sub.2O.sub.3) and tetravalent Ce.sup.4+ (CeO.sub.2) states, wherein the cerium oxide nano particles are configured to be released when the glass is dissolved.

A slurry containing abrasive grains and a liquid medium, in which the abrasive grains include first particles and second particles in contact with the first particles, a particle size of the second particles is smaller than a particle size of the first particles, the first particles contain cerium oxide, the second particles contain a cerium compound, and in a case where a content of the abrasive grains is 0.1% by mass, an absorbance for light having a wavelength of 380 nm in a liquid phase obtained when the slurry is subjected to centrifugal separation for 5 minutes at a centrifugal acceleration of 5.8×10.sup.4 G exceeds 0.