C03C3/105

THICK FILM RESISTOR AND PRODUCTION METHOD FOR SAME
20180108460 · 2018-04-19 · ·

A thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The thick film resistor is formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component essentially free of a lead component and has a resistance value in the range of 100 / to 10 M/ and a temperature coefficient of resistance within 100 ppm/ C.

THICK FILM RESISTOR AND PRODUCTION METHOD FOR SAME
20180108460 · 2018-04-19 · ·

A thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The thick film resistor is formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component essentially free of a lead component and has a resistance value in the range of 100 / to 10 M/ and a temperature coefficient of resistance within 100 ppm/ C.

High temperature and bright red ink-jet ink for ceramic decoration, its preparation method and application thereof
20180105473 · 2018-04-19 ·

The present invention provides a high temperature and bright red ink-jet ink for ceramic decoration, its preparation method and application thereof. On the base that the existing ink-jet ink production process, ink-jet printing equipment and ink-jet printing process are not made major changes, high temperature bright red ink basic glaze powder composition, basic glaze frit powder composition, solvent composition, basic glaze powder and bright red pigment grinding method and particle size optimization, ink composition and processing methods are adjusted and optimized. Thus the performance of high temperature bright red ink can meet the requirement of the use of ink-jet printing machine, and after high temperature firing (1080? C.?1230? C.), the surface decoration color of ceramic tile sprayed a single printed high temperature bright red is bright red, colorful, pure red, and at the superposing place with other color ink-jet printing ink, the color is bright, colorful, color gamut broad. At the same time, the technology has strong universality and is easy to popularize in the industry.

Thick film resistor and production method for same
09892828 · 2018-02-13 · ·

A thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The thick film resistor is formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component essentially free of a lead component and has a resistance value in the range of 100/ to 10 M/ and a temperature coefficient of resistance within 100 ppm/ C.

Thick film resistor and production method for same
09892828 · 2018-02-13 · ·

A thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The thick film resistor is formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component essentially free of a lead component and has a resistance value in the range of 100/ to 10 M/ and a temperature coefficient of resistance within 100 ppm/ C.

METHOD FOR PRODUCTION OF A COATED, CHEMICALLY PRESTRESSED GLASS SUBSTRATE HAVING ANTI-FINGERPRINT PROPERTIES AND PRODUCED GLASS SUBSTRATE
20170183257 · 2017-06-29 · ·

The invention relates to a method for producing a coated, chemically prestressed glass substrate having anti-fingerprint properties. The method includes: applying at least one functional layer to a glass substrate; chemically prestressing the coated glass substrate by an ion exchange, where existing smaller alkali metal ions are exchanged for larger alkali metal ions, and are enriched in the glass substrate and the at least one functional layer; activating the surface of the at least one functional layer, where if more than one functional layer is present the surface of the outermost or uppermost layer is activated, the activating including one of several alternatives; and applying an amphiphobic coating to the at least one functional layer of the glass substrate, where, as a result of the activation process, the functional layer interacts with the amphiphobic coating.

METHOD FOR PRODUCTION OF A COATED, CHEMICALLY PRESTRESSED GLASS SUBSTRATE HAVING ANTI-FINGERPRINT PROPERTIES AND PRODUCED GLASS SUBSTRATE
20170183257 · 2017-06-29 · ·

The invention relates to a method for producing a coated, chemically prestressed glass substrate having anti-fingerprint properties. The method includes: applying at least one functional layer to a glass substrate; chemically prestressing the coated glass substrate by an ion exchange, where existing smaller alkali metal ions are exchanged for larger alkali metal ions, and are enriched in the glass substrate and the at least one functional layer; activating the surface of the at least one functional layer, where if more than one functional layer is present the surface of the outermost or uppermost layer is activated, the activating including one of several alternatives; and applying an amphiphobic coating to the at least one functional layer of the glass substrate, where, as a result of the activation process, the functional layer interacts with the amphiphobic coating.

THICK FILM RESISTOR AND PRODUCTION METHOD FOR SAME
20170011825 · 2017-01-12 · ·

An object of the present invention is to provide a thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The present invention is a thick film resistor formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component being essentially free of a lead component and has a resistance value in the range of 100 / to 10 M/ and a temperature coefficient of resistance within 100 ppm/ C.

GLASS PLATE AND METHOD FOR PRODUCING GLASS PLATE

The present invention relates to a glass plate having two main surfaces, including 50 ppm to 2,500 ppm of Sb.sub.2O.sub.3 in ppm by mass in terms of oxides, in which when a transmittance in a thickness direction of the glass plate is defined as T (%) in percentage, a transmittance in the thickness direction after removing a surface layer of 10 m from each of the two main surfaces of the glass plate is defined as U (%) in percentage, and U-T at a wavelength of 380 nm is defined as (U-T).sub.380, the (U-T).sub.380 is 1.3% or more, and a haze is 2.0% or less.

GLASS PLATE AND METHOD FOR PRODUCING GLASS PLATE

The present invention relates to a glass plate having two main surfaces, including 50 ppm to 2,500 ppm of Sb.sub.2O.sub.3 in ppm by mass in terms of oxides, in which when a transmittance in a thickness direction of the glass plate is defined as T (%) in percentage, a transmittance in the thickness direction after removing a surface layer of 10 m from each of the two main surfaces of the glass plate is defined as U (%) in percentage, and U-T at a wavelength of 380 nm is defined as (U-T).sub.380, the (U-T).sub.380 is 1.3% or more, and a haze is 2.0% or less.