C03C17/2456

Heat treatable coated glass pane

A method of manufacturing a coated glass pane comprising the following steps in sequence a) providing a glass substrate, b) depositing by chemical vapour deposition (CVD) at least one CVD coating on a surface of the glass substrate using titanium tetraisopropoxide (TTIP) as a precursor, and c) depositing by physical vapour deposition (PVD) at least one PVD coating on said at least one CVD coating.

CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A COATING AND THE COATING FORMED THEREBY
20210094868 · 2021-04-01 ·

A chemical vapor deposition process for depositing a coating comprising silicon oxide and titanium oxide is provided. A coating formed by the chemical vapor deposition process is also provided.

Glass Container, And Method And Apparatus For Manufacturing The Same
20210094869 · 2021-04-01 ·

A glass container has a container main body made of glass and a coating film formed on a surface of the container main body. The coating film is made of tin oxide or titanium oxide, and the film thickness of the coating film ranges from 40 nm to 50 nm. In the depth profile obtained by X-ray photoelectron spectroscopy (XPS) analysis, an atomic percentage of sodium at a point where a tin or titanium profile intersects a silicon profile is 2% or less.

Process and plant for obtaining colored glazing

A process for depositing a coating on a glass substrate includes co-sputtered simultaneously by a plasma, in one and the same chamber of the vacuum deposition device, a first constituent made of a material consisting of an oxide, a nitride or an oxynitride of a first element and a second constituent consisting of the metallic form of a second element. The process also includes introducing a hydride, a halide or an organic compound of a third element, different than the first element, into the plasma, to recover the substrate covered with the coating comprising the first, second and third elements at the outlet of the device. The coating consists of metal nanoparticles of the second element dispersed in an inorganic matrix of the first and third elements. The coating displays a plasmon absorption peak in the visible region.

ANTI-GLARE GLASS SHEET

A glass sheet comprising at least one antireflective, etched surface having a surface roughness defined, when measured on an evaluation length of 12 mm and with a Gaussian filter with a cut-off wavelength is 0.8 mm, by: 0.02Ra0.6 m; 0.1Rz3 m; and 5RSm180 m. The glass sheet has the following optical properties, when measured from the antireflective, etched surface: a haze value of from 1 to 40%; a clarity value of from 30 to 100%; a gloss value at 60 of from 20 to 130 SGU; and a luminous reflectance Rc from 4 to 7%. The antireflective, etched surface comprises implanted ions. Such a glass sheet is particularly suitable for display applications as cover glass and has excellent sparkle reduction properties together with an anti-glare effect.

UV-curing primer composition for the coating of glass

The invention relates to a UV-curing primer composition for the coating of glass, in particular glass hollow bodies, wherein the primer composition, in addition to reactive oligomers and/or reactive monomers and at least one photoinitiator, comprises at least one organosilane, which possesses at least one acetoxy radical, in particular 1 to 4 acetoxy radicals. The invention further relates to use of at least one organosilane for providing a UV-cured primer layer on glass and/or an ink layer on glass, a method for coating glass, a substrate coated with a UV-cured primer layer, an ink and a kit.

Superhydrophilic and antifogging non-porous TiO.SUB.2 .films for glass and methods of providing the same

Superhydrophilic and antifogging non-porous TiO.sub.2 films for glass substrates and methods of providing the TiO.sub.2 films are provided. The TiO.sub.2 films may maintain a water contact angle less than 5 in the dark for five days after an annealing treatment, and the water contact angle of the TiO.sub.2 films may stabilize at less than 20 after ten days from the annealing treatment. The TiO.sub.2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO.sub.2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO.sub.2 film after depositing the TiO.sub.2 film on the glass substrate. The methods may not include UV radiation.

Method of manufacture of a coated glazing

A method of manufacture of a coated glazing includes the following steps in sequence a) providing a transparent glass substrate, b) etching a surface of the substrate with an acidic gas, and c) directly or indirectly coating said surface with at least one layer based on a transparent conductive coating (TCC) and/or at least one layer based on a material with a refractive index of at least 1.75.

METHOD OF MANUFACTURE OF A COATED GLAZING

A method of manufacture of a coated glazing includes the following steps in sequence a) providing a transparent glass substrate, b) etching a surface of the substrate with an acidic gas, and c) directly or indirectly coating said surface with at least one layer based on a transparent conductive coating (TCC) and/or at least one layer based on a material with a refractive index of at least 1.75.

LAMINATE AND METHOD FOR PRODUCING LAMINATE

A laminate including a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, wherein a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.0510.sup.3 to 1.210.sup.3, and wherein a radius of curvature r1 of the laminate with negating of self-weight deflection is 10 m to 150 m.