The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

A heat insulating glass unit for vehicle includes a laminated glass in which a first glass plate and a second glass plate are bonded to each other via an intermediate film; a color tone compensation film arranged on at least one surface of the laminated glass; a transparent conductive layer mainly including an ITO arranged on the color tone compensation film; and an upper part layer arranged on the transparent conductive layer. A refraction index of the upper part layer for a light with a wavelength of 630 nm is 1.7 or less. The color tone compensation film has at least first and second layers. The first layer is arranged at a position closer to the laminated glass than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer.

A method of making a doped titanium oxide coating in a float glass manufacturing process and the coated glass article made thereby wherein the dopant is a niobium or tantalum compound. The doped titanium oxide coating preferably exhibits an electrical conductivity>110.sup.3 S/cm.

Superhydrophilic and antifogging non-porous TiO.sub.2 films for glass substrates and methods of providing the TiO.sub.2 films are provided. The TiO.sub.2 films may maintain a water contact angle less than 5 in the dark for five days after an annealing treatment, and the water contact angle of the TiO.sub.2 films may stabilize at less than 20 after ten days from the annealing treatment. The TiO.sub.2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO.sub.2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO.sub.2 film after depositing the TiO.sub.2 film on the glass substrate. The methods may not include UV radiation.

A coated glazing comprising: a transparent glass substrate, wherein a surface of the substrate is directly or indirectly coated with at least one layer based on a transparent conductive coating (TCC) and/or at least one layer based on a material with a refractive index of at least 1.75, and wherein said surface has an arithmetical mean height of the surface value, Sa, of at least 0.4 nm prior to said coating of said surface.

The present invention provides a lamination system comprising a substrate and a highly reflective layer, which is formed on the substrate and has a reflective index of 2.0 or greater and a thickness of 70 nm or less.

Provided is an optical member which includes: a substrate; and a laminated structure including two or more kinds of layers having different materials which are disposed on the substrate, in which the number of layers constituting the laminated structure is 10 or more, the maximum layer thickness of the layers constituting the laminated structure is 8 nm or less, and the minimum transmittance in a wavelength range of 400 nm to 800 nm or in a wavelength range of 6 m to 12 m is 10% or more.

Certain example embodiments of this invention relate to techniques for converting sputter-deposited TiNx or TiOxNy layers into TiOx layers via activation with electromagnetic radiation. An intermediate layer including TiOxNy, 0<y1 is formed on a substrate. The intermediate layer is exposed to the radiation, which is preferentially absorbed by the intermediate layer in an amount sufficient to heat the intermediate layer to a temperature of 500-650 degrees C. while keeping the substrate at a significantly lower temperature. A flash light operated with a series of millisecond or sub-millisecond length pulses may be used in this regard. The converting removes nitrogen from, and introduces oxygen into, the intermediate layer, causing the layer to expand beyond its initial thickness. At least some of the final layer may have an anatase phase, and it may be photocatalytic. These layers may be used in low-maintenance glass, antireflective, and/or other applications.

The present disclosure provides a method for manufacturing a touch panel, the touch panel, a touch screen and a display device. The method includes steps of: forming, on a transparent substrate, a non-opaque film layer with a micro-pattern; and forming a touch panel electrode on the non-opaque film layer. The non-opaque film layer is configured to vanish a shadow of the touch panel electrode.