Embodiments of a glass wafer for semiconductor fabrication processes are described herein. In some embodiments, a glass wafer includes: a glass substrate comprising: a top surface, a bottom surface opposing the top surface, and an edge surface between the top surface and the bottom surface; a first coating disposed atop the glass substrate, wherein the first coating is a doped crystalline silicon coating having a sheet-resistance of 100 to 1,000,000 ohm per square; and a second coating having one or more layers disposed atop the glass substrate, wherein the second coating comprises a silicon containing coating, wherein the glass wafer has an average transmittance (T) of less than 50% over an entire wavelength range of 400 nm to 1000 nm.

An optical member includes a transparent substrate containing at least one substance selected from glass, a glass ceramic, silicon, and sapphire, and having an infrared high-transmittance region in which an optical transmittance is 78% or more in a wavelength band of 700 nm to 1800 nm; and an optical interference film disposed on a main surface of the transparent substrate corresponding to the infrared high-transmittance region, wherein a transmittance of light, of the optical member, of at least one wavelength λ.sub.3 in the wavelength band of 700 nm to 1800 nm in a region of the optical member corresponding to the infrared high-transmittance region of the transparent substrate has a minimum value of 86.5% or more and has a difference between the minimum value and a maximum value of 9% or less in a range where an incidence angle is from 0 degrees to 60 degrees.

The present disclosure relates to an optical filter and an infrared image sensing system including the optical filter. The optical filter includes a glass substrate, and an IR film layer and an AR film layer plated on two opposite surfaces of the glass substrate; the IR film layer includes a first refractive-index-material layer, a second refractive-index-material layer, and a third refractive-index-material layer; the refractive index of the third refractive-index-material layer is greater than the refractive index of the first refractive-index-material layer, and the refractive index of the second refractive-index-material layer is greater than the refractive index of the third refractive-index-material layer. The optical filter of the present disclosure has a good anti-reflection effect on near-infrared light so that a high accuracy of face recognition and gesture recognition is ensured.

A detection device includes (a) a LiDAR sensing device and (b) a housing enclosing the LiDAR sensing device, the housing including at least one cover lens. At least a portion of the cover lens is made of at least one glass sheet having an absorption coefficient lower than 5 m.sup.1 in the wavelength range from 750 to 1650 nm. The cover lens helps to protect the LiDAR sensing device from external degradation.

An optical component according to an embodiment of the present invention includes a translucent substrate, one or more intermediate layers stacked on at least one of an incident surface and an exit surface of the substrate, and a surface layer stacked on an outermost layer of the one or more intermediate layers, the surface layer containing diamond-like carbon as a main component. At least one intermediate layer among the one or more intermediate layers contains silicon as a main component, and the intermediate layer containing silicon as a main component has an oxygen content of 10 atomic % or less.

An optical filter and a method for forming the same are provided. The optical filter includes a substrate and a plurality of filter stacks formed on the substrate. Each of the plurality of filter stacks includes a higher-refractive-index layer, a medium-refractive-index layer, and a lower-refractive-index layer. The higher-refractive-index layer has a first refractive index of higher than 3.5. The medium-refractive-index layer is disposed on the higher-refractive-index layer. The medium-refractive-index layer has a second refractive index higher than 2.9 and lower than the first refractive index. The lower-refractive-index layer is disposed on the medium-refractive-index layer. The lower-refractive-index layer has a third refractive index lower than the second refractive index.

A coating for a glass substrate is a multilayer coating including at least one silicon layer. The at least one silicon layer has a carbon content gradient over its layer thickness.

A heat treatable decorative patterned glass article ha a selectively dissolvable coating. The selectively dissolvable coating is a silicon based monolayer optical coating which is intended to be selectively dissolved in regions underlying a patterned enamel coating during a processing operation of the transparent substrate. The decorative patterned glass article provides excellent contrast to the glass when viewed from the glass side and can withstand the high tempering temperatures during the making of the decorative glass article.

A method of making a reflective coated glass article includes providing a glass substrate. A first gaseous mixture is formed. The first gaseous mixture includes a silane compound and inert gas. The first gaseous mixture is delivered to a location above a major surface of the glass substrate to deposit a first coating layer directly on the major surface of the glass substrate. The first coating layer is deposited at a thickness of 5-50 nm. A second gaseous mixture is formed. The second gaseous mixture includes a silane compound, a radical scavenger and molecular oxygen. The second gaseous mixture is delivered to a location above the first coating layer. A second coating layer is deposited at a thickness of 5-50 nm over the first coating layer. The coated glass article exhibits a total visible light reflectance (Illuminant D65, ten degree observer) of 45% or more from a coated side of the coated glass article.

An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.