Provided is a Low-E glass plate protection method capable of preventing or inhibiting alteration and erosion of Low-E layers. The protection method includes a step of applying a protective sheet to a surface of a Low-E glass plate having a Low-E layer comprising a tin component. Here, the Low-E layer comprises a tin component. The protective sheet has a PSA layer. The PSA layer comprises a phosphorus compound having a POR group. Here, R is a hydrogen atom or an organic group.

Provided is a functional building material for windows and doors, which is a multi-layered structure including: a transparent glass substrate; and a low emissivity coating formed on a surface of the transparent glass substrate, wherein the low emissivity coating includes a lowermost barrier layer, a dielectric layer, a low emissivity protective layer, a low emissivity layer, and an uppermost protective layer, wherein the lowermost barrier layer is located at the lowermost portion of the low emissivity coating to contact the transparent glass substrate, and the uppermost protective layer is located at the uppermost portion at which the low emissivity coating is outwardly exposed, wherein the lowermost barrier layer is multi-layered to include a first layer contacting the transparent glass substrate and a second layer located on the upper part of the first layer.

A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one high refractive index dielectric multilayer film. The high index dielectric multilayer film may be of or include a first high index layer of or including ZrSiN and/or ZrSiAlN, and a second high index layer of or including titanium oxide (e.g., TiO.sub.2). The first high index layer of or including ZrSiN and/or ZrSiAlN may be amorphous or substantially amorphous, and the second high index layer of or including titanium oxide may be substantially crystalline in certain example embodiments. The low-E coating may be used in applications such as monolithic or insulating glass (IG) window units, vehicle windows, or the like.

A coated substrate, including a transparent substrate provided with a p-polarized light reflective coating. The p-polarized light reflective coating contains, in sequence starting from a substrate surface, optionally a first coating containing one or more layers of a high refractive index material, optionally a second coating containing one or more layers of a low refractive index material, a third coating containing one or more layers of a high refractive index material, a fourth coating containing one or more layers of a low refractive index material, and further including at least one first layer of absorbent material.

A reflective optical coating has a thin film of silver as the primary reflecting material, a thin protective anti-oxidation layer of nickel oxide (NiO) deposited directly on top of the silver layer, and one or more thin transparent barrier layers deposited on top of the NiO, where each barrier layer is composed of a fluoride, a metal oxide, or a nitride. Optionally, a thin protective layer of NiO or Ni may be included, directly beneath the silver layer. Optionally, one or more thin barrier underlayer(s) may be included below the silver (and below the Ni or NiO protective layer, if present), where each of the barrier underlayers is a fluoride, a metal oxide, a metal nitride, or a bare metal.

An electronic device may include electrical components and other components mounted within a housing. The device may have a display on a front face of the device and may have a glass layer that forms part of the housing on a rear face of the device. The glass layer and other glass structures in the electronic device may be provided with coatings. An interior coating on a glass layer may include multiple layers of material such as an adhesion promotion layer, thin-film layers of materials such as silicon, niobium oxide and other metal oxides, and metals to help adjust the appearance of the coating. A metal layer may be formed on top of the coating to serve as an environmental protection layer and opacity enhancement layer. In some configurations, the coating may include four layers.

Embodiments of the present disclosure generally relate to encapsulated optical devices and methods for fabricating the encapsulated optical devices. In one or more embodiments, a method for encapsulating an optical device includes depositing a metallic silver layer on a substrate, depositing a barrier layer on the metallic silver layer, where the barrier layer contains silicon nitride, a metallic element, a metal nitride, or any combination thereof, and depositing an encapsulation layer containing silicon oxide on the barrier layer.

A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one high refractive index dielectric multilayer film. The high index dielectric multilayer film may be of or include a first high index layer of or including ZrSiN and/or ZrSiAlN, and a second high index layer of or including titanium oxide (e.g., TiO.sub.2). The first high index layer of or including ZrSiN and/or ZrSiAlN may be amorphous or substantially amorphous, and the second high index layer of or including titanium oxide may be substantially crystalline in certain example embodiments. The low-E coating may be used in applications such as monolithic or insulating glass (IG) window units, vehicle windows, or the like.

A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also disclosed. A method of coating a substrate is further disclosed.

A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one high refractive index dielectric multilayer film. The high index dielectric multilayer film may be of or include a first high index layer of or including ZrSiN and/or ZrSiAlN, and a second high index layer of or including titanium oxide (e.g., TiO.sub.2). The first high index layer of or including ZrSiN and/or ZrSiAlN may be amorphous or substantially amorphous, and the second high index layer of or including titanium oxide may be substantially crystalline in certain example embodiments. The low-E coating may be used in applications such as monolithic or insulating glass (IG) window units, vehicle windows, or the like.