This invention relates to a coated article including a low-emissivity (low-E) coating. In certain example embodiments, the low-E coating is provided on a substrate (e.g., glass substrate) and includes at least first and second infrared (IR) reflecting layers (e.g., silver based layers) that are spaced apart by contact layers (e.g., NiCr based layers) and a dielectric layer of or including a material such as silicon nitride. In certain example embodiments, the coated article has a low visible transmission (e.g., no greater than 60%, more preferably no greater than about 55%, and most preferably no greater than about 50%).

A transparent pane having at least one transparent substrate and at least one an electrically conductive coating on at least one surface of the transparent substrate. The electrically conductive coating has at least two functional layers arranged one on top of another. Each functional layer contains: a layer of optically highly refractive material; a smoothing layer above the layer of optically highly refractive material; a lower adapting (matching) layer above the smoothing layer; an electrically conductive layer above the lower adapting layer; and an upper adapting (matching) layer above the electrically conductive layer. The lower adapting layer and/or the upper adapting layer contain a homogeneously distributed getter material. At least one lower adapting layer and/or upper adapting layer containing the getter material is in direct contact with the electrically conductive layer.

Techniques, processes and structures are disclosed for providing markings on products, such as electronic devices. For example, the markings can be formed using physical vapor deposition (PVD) processes to deposit a layer of material. The markings or labels may be textual and/or graphic. The markings are deposited on a compliant layer that is disposed on a surface to be marked. The compliant layer is arranged to isolate the surface to be marked from the layer of material deposited using the PVD process.

A glass article that comprises a composite coating is provided. The coating is provided on a surface of a glass substrate and comprises a paint layer that overlies the surface of the glass substrate and a hydrophobic layer that overlies the paint layer. The coating may exhibit a E value of about 2 or less after being exposed to a copper-accelerated acetic acid-salt spray (CASS) in accordance with ASTM B368-09 (2014).

This invention relates to a coated article including a low-emissivity (low-E) coating. In certain example embodiments, the low-E coating is provided on a substrate (e.g., glass substrate) and includes at least first and second infrared (IR) reflecting layers (e.g., silver based layers) that are spaced apart by contact layers (e.g., NiCr based layers) and a dielectric layer of or including a material such as silicon nitride. In certain example embodiments, the coated article has a low visible transmission (e.g., no greater than 60%, more preferably no greater than about 55%, and most preferably no greater than about 50%).

A transparent pane having at least one transparent substrate and at least one an electrically conductive coating on at least one surface of the transparent substrate. The electrically conductive coating has at least two functional layers arranged one on top of another. Each functional layer contains: a layer of optically highly refractive material; a smoothing layer above the layer of optically highly refractive material; a lower adapting (matching) layer above the smoothing layer; an electrically conductive layer above the lower adapting layer; and an upper adapting (matching) layer above the electrically conductive layer. The lower adapting layer and/or the upper adapting layer contain a homogeneously distributed getter material. At least one lower adapting layer and/or upper adapting layer containing the getter material is in direct contact with the electrically conductive layer.

Disclosed is a multi-layered low-emissivity coating sequentially comprising: a Ti-based oxide layer, a composite metallic oxide layer of zinc and aluminum, a low-emissivity protective metal layer, and a low-emissivity layer.

The invention relates to a solar control glass panel comprising, on at least one of the surfaces of a glass substrate, a multilayer stack including at least one solar radiation absorption layer, and dielectric coatings surrounding said solar radiation absorption layer. According to the invention, the solar radiation absorption layer is a metal alloy layer made from zirconium and chromium. The multilayer stack includes, between the substrate and the solar radiation absorption layer, as well as on top of the solar radiation absorption layer, at least one coating made of a dielectric material made from a compound selected from among silicon oxide, aluminum oxide, silicon nitride, aluminum nitride, mixed aluminum/silicon nitrides, silicon oxynitride, and aluminum oxynitride. The invention is particularly useful as a motor vehicle glass panel, particularly for the roof, as a building glass panel, or as a household stove door.

A transparent substrate provided with a stack of thin layers includes an alternation of n functional layers having reflection properties in the infrared region and/or in solar radiation with n2 and of n+1 coatings including one or more dielectric layers, so that each functional layer is positioned between two coatings, the coatings and the functional layers are numbered according to their position with respect to the transparent substrate, the lower coating 1 is placed above the transparent substrate and below the functional layer 1, the intermediate coatings 2 to n are placed between two functional layers and the upper coating n+1 is placed above the functional layer n, wherein at least one of the upper or intermediate coatings 2 to n+1 includes at least one barrier coating including at least two barrier layers, one layer including silicon and one layer based on aluminum nitride.

Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 m1 m with an atomic force microscope, and has a power spectrum density of not more than 10 nm.sup.4 at a spatial frequency of not less than 1 m.sup.1.