A glass wafer having a first major surface, a second major surface that is parallel to and opposite of the first major surface, a thickness between the first major surface and the second major surface, and an annular edge portion that extends from an outermost diameter of the glass wafer toward the geometrical center of the glass wafer. The glass wafer has a diameter from greater than or equal to 175 mm to less than or equal to 325 mm and a thickness of less than 0.350 mm. A width of the edge portion is less than 10 mm.

The present invention provides a glass fiber composition, glass fiber and composite material therefrom. The glass fiber composition comprises the following components expressed as percentage by weight: 58-63% SiO.sub.2, 13-17% Al.sub.2O.sub.3, 6-11.8% CaO, 7-11% MgO, 3.05-8% SrO, 0.1-2% Na.sub.2O+K.sub.2O+Li.sub.2O, 0.1-1% Fe.sub.2O.sub.3, 0-1% CeO.sub.2 and 0-2% TiO.sub.2, wherein a weight percentage ratio C1=(MgO+SrO)/CaO is greater than 1. Said composition greatly improves the refractive index of glass, significantly shields against harmful rays for humans and further reduces glass crystallization risk and production costs, thereby making it more suitable for large-scale production with refractory-lined furnaces.

A doping optimized single-mode optical fiber with ultra low attenuation includes a core layer and cladding layers. The cladding layers has an inner cladding layer surrounding the core layer, a trench cladding layer surrounding the inner cladding layer, an auxiliary outer cladding layer surrounding the trench cladding layer, and an outer cladding layer surrounding the auxiliary outer cladding layer. The content of fluorine in the core layer is 0.5 wt %, Ge0.12%, n.sub.10.12%. The content of fluorine in the inner cladding layer is 0.5-1.5 wt %, n.sub.20.14%. The content of fluorine in the trench cladding layer is 1-3 wt %, n.sub.30.25%. The content of fluorine in the auxiliary outer cladding layer is 0.5-2 wt %, n.sub.40.14%. The outer cladding layer is a pure silicon dioxide glass layer and/or a metal-doped silicon dioxide glass layer.

A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.

A method includes applying a laser directly to a surface of a glass substrate to smooth the surface of the glass substrate. The method can further include applying a reflective coating directly to the smoothed surface of the glass substrate. An apparatus can include a titania-silica glass substrate having a laser polished surface that is not a separate layer from the glass substrate. The apparatus can include a reflective surface applied directly to the laser polished surface.

Techniques for precise and accurate doping of nanoporous silica gel or silica glass that include forming a silica gel slurry that includes an activated silica gel and a solvent, adding a metal dopant to the silica gel slurry to form a mixture, mixing the mixture of the metal dopant and the silica gel slurry, and removing the solvent from the mixture to form a doped silica gel.

A cover glass lamination structure includes: a glass substrate having opposed first and second surfaces; an ultraviolet (UV) textured layer disposed on the first surface; and a coating layer disposed on the UV textured layer, wherein an inner edge of the coating layer extends beyond an inner edge of the UV textured layer and is attached to the first surface.

A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.

A doped silica-titania (DST) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B.sub.2O.sub.3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B.sub.2O.sub.3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K.sup.2 at 20? C. For DST glass articles doped with F or B.sub.2O.sub.3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO.sub.2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al.sub.2O.sub.3, CeO.sub.2, TiO.sub.2, La.sub.2O.sub.3, Y.sub.2O.sub.3, Nd.sub.2O.sub.3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000 C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.