A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.

A glass container that includes a microwave susceptor coating on an exterior surface thereof, and a process for healing flaws in an exterior portion of the glass container. When the glass container is exposed to microwave radiation, the microwave susceptor coating generates heat and selectively and locally provides a major portion of such heat to regions of glass in the exterior portion of the glass container that are in close proximity to the flaws. These regions of glass in the exterior portion of the glass container may be selectively and locally heated so that the glass therein can flow and thereby fill-in the flaws in the exterior portion of the glass container. This process can be used to heal flaws in an exterior portion of a glass container without impairing the structural integrity of the glass container.

A layered product includes a substrate including a first surface and second surface that face each other, wherein the layered product includes a metal film on the first surface of the substrate, wherein gaps are dispersed between the substrate and the metal film, the gaps optically affecting light in a visible light region, wherein, when the layered product is measured from the second surface of the substrate, an absorption ratio with respect to visible light, the absorption ratio being an average value in a range of wavelength from 400 nm to 700 nm, is greater than or equal to 50%, reflectance, the reflectance being an average value in a range of wavelength from 400 nm to 700 nm, is less than or equal to 40%, and brightness L* of a D65 light source in a visual field of 10 degrees is less than or equal to 70.

The present invention relates to a nano bi-material, electromagnetic spectrum shifter based on said nano bi-material and method to produce said electromagnetic spectrum shifter using said nano bi-material. In particular, the present invention provides nano bi-material based electromagnetic spectrum shifter, e.g. color filters, with a wide range of transmission and color tunability and methods to produce said color filters. The present invention has applications in color filtration and production of color filters; reflector and production of reflectors; and electromagnetic spectrum shifter and production of electromagnetic spectrum shifters.

A structured polarizer includes a substrate including a dielectric material including elongated metal particles embedded to form a polarizing layer including a plurality of first polarizing regions having first elongated metal particles collectively aligned along a first direction and a plurality of second regions having second metal particles, the first polarizing regions and the second regions adjoining each other, the first metal particles being in the same plane as the second metal particles, a degree of polarization with respect to the first direction in the first polarizing regions at between 0.5 m and 1 m from a boundary between the first polarizing regions and the second regions being more than 90%, and a degree of polarization with respect to the first direction in the second regions at between 0.5 m and 1 m from the boundary between the first polarizing regions and the second regions being less than 10%.

A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.

A method of manufacturing a glass substrate to control the fragmentation characteristics by etching and filling trenches in the glass substrate is disclosed. An etching pattern may be determined. The etching pattern may outline where trenches will be etched into a surface of the glass substrate. The etching pattern may be configured so that the glass substrate, when fractured, has a smaller fragmentation size than chemically strengthened glass that has not been etched. A mask may be created in accordance with the etching pattern, and the mask may be applied to a surface of the glass substrate. The surface of the glass substrate may then be etched to create trenches. A filler material may be deposited into the trenches.

The disclosure relates to a method for making a metal nanowire film. The method includes applying a metal layer on a substrate; placing a carbon nanotube composite structure on the metal layer, wherein the carbon nanotube composite structure defines a number of openings and parts of the metal layer are exposed by the number of openings; dry etching the metal layer using the carbon nanotube composite structure as a mask; and removing the carbon nanotube composite structure. The carbon nanotube composite structure includes a carbon nanotube structure and a protective layer coated on the carbon nanotube structure. The carbon nanotube structure includes a number of carbon nanotubes arranged substantially along the same direction.

A method for making sputtered metallic thin film is provided. In another aspect, a method emits ions from an ion source and sputters a metal material with a magnetron to deposit an ultra-thin silver film on a workpiece substrate, with the film having a thickness of less than 9 nm. Another method of coating a workpiece substrate includes sputter deposition of an initial or seed layer of silver, having a thickness of 6 nm or less, and ion treating the initial silver layer from an ion source during the sputtering. A further aspect deposits at least one silver layer on a transparent substrate, and an aluminum cap on the silver layer(s).

A coated glass element includes: a glass surface and a coating that coats at least part of the glass surface. The coating has at least one layer. The at least one layer of the coating fulfills the following parameter: [Al.sup.+].sub.80/[Al.sup.+].sub.201.8. [Al.sup.+].sub.20 are counts of [Al.sup.+] ions, measured by a time-of-flight secondary ion mass spectrometry (TOF-SIMS), at 20% of a time a sputter gun beam needs to reach the glass surface and [Al.sup.+].sub.80 are counts of [Al.sup.+] ions, measured by a TOF-SIMS, at 80% of a time a sputter gun beam needs to reach the glass surface.