A method of manufacturing a variable reflectance mirror reflective element suitable for use in a vehicular rearview mirror assembly includes providing a front glass sheet and a plurality of rear glass substrates, and joining and spacing the rear glass substrates at the front glass sheet via perimeter seals. After the rear glass substrates are joined with the front glass sheet, the front glass sheet is cut to form a plurality of front glass substrates. A back plate is attached at the rear side of each of the rear glass substrates. After cutting the front glass sheet, the back plate of the respective rear glass substrate and cut front glass substrate portion is fixtured at a finishing tool, which processes the cut edges of at least the respective front glass substrate to provide a finished perimeter edge of the front glass substrate to form a variable reflectance mirror reflective element.

A method of manufacturing a variable reflectance mirror reflective element suitable for use in a vehicular rearview mirror assembly includes providing a front glass sheet and a plurality of rear glass substrates, and joining and spacing the rear glass substrates at the front glass sheet via perimeter seals. After the rear glass substrates are joined with the front glass sheet, the front glass sheet is cut to form a plurality of front glass substrates. A back plate is attached at the rear side of each of the rear glass substrates. After cutting the front glass sheet, the back plate of the respective rear glass substrate and cut front glass substrate portion is fixtured at a finishing tool, which processes the cut edges of at least the respective front glass substrate to provide a finished perimeter edge of the front glass substrate to form a variable reflectance mirror reflective element.

A process for obtaining a decorative mirror includes reflective regions forming a pattern and non-reflective regions, the process including providing a sheet of soda-lime-silica glass coated with a reflective coating on the entirety of one of the faces thereof, then applying a composition including a phosphate salt to the reflective coating, solely in application regions, the application regions being intended to become the non-reflective regions, then tempering the glass sheet, in which the glass sheet is subjected to a temperature of at least 550° C., causing the reflective coating to dissolve in the application regions so as to form the non-reflective regions in which the glass sheet is not coated.

A composite tungsten oxide film having high film smoothness, with a function to shield infrared light by reflecting infrared light by a thermal insulation, while maintaining transparency in a visible light region, and a method for manufacturing the composite tungsten oxide film, and a film-deposited base material or an article using these functions. A composite tungsten oxide film including a composition with a general formula M.sub.xW.sub.yO.sub.z as main components, wherein 0.001≤x/y≤1, 2.2≤z/y≤3.0, organic components are not contained substantially, a transmittance in a wavelength of 550 nm is 50% or more, a transmittance in a wavelength of 1400 nm is 30% or less, and also, a reflectance in a wavelength of 1400 nm is 35% or more.

A multilayered-reflective-film-provided substrate includes: a substrate; a multilayered reflective film provided on the substrate; and a protective film provided on the multilayered reflective film, in which the protective film includes ruthenium (Ru) and at least one additive material selected from aluminum (Al), yttrium (Y), zirconium (Zr), rhodium (Rh), and hafnium (Hf), and a content of the additive material is 5% or more by atom and less than 50% by atom.

A substrate carrier made of glass for processing a transparent or transmissive substrate by electromagnetic radiation includes a first upper side serving as a substrate support and a lower side facing away from the upper side. The substrate support and/or the lower side of the substrate carrier has a structuring produced by modifications in the substrate carrier and a material removal by action of an etching medium in respective regions of the modifications in the substrate carrier. The structuring has a plurality of adjacent and/or merging conical recesses. At least one of the conical recesses is configured as a through-hole of the substrate carrier between the substrate support and the lower side, and a plurality of other ones of the conical recesses are configured as depressions.

A method of fabricating a metal thin film-on-glass structure. A glass substrate, on a top surface of which a layer is formed, is prepared. A local area of the glass substrate is etched from a bottom of the glass substrate to expose the layer downwardly, thereby forming an exposed area of the layer. The layer is a metal thin film. The etching includes first-etching the glass substrate to a depth less than a thickness of the glass substrate using a first etching solution containing hydrofluoric acid and at least one of nitric acid and sulfuric acid, resulting in a first-etched portion of the glass substrate; and second-etching the first-etched portion of the glass substrate using an etching solution containing hydrofluoric acid without nitric acid or sulfuric acid, so that the layer is exposed downwardly, whereby the metal thin film is supported by a remaining portion of the glass substrate.

A projection arrangement for a head-up display, including a composite pane, including an outer pane and an inner pane, which are joined to one another via a thermoplastic intermediate layer, having an upper edge and a lower edge and an HUD region; an electrically conductive coating on the surface of the outer pane or the inner pane facing the intermediate layer or provided within the intermediate layer; and a projector that is aimed at the HUD region; wherein the light of the projector has at least one p-polarised portion and wherein the electrically conductive coating has, in the spectral range from 400 nm to 650 nm, only a single local reflection maximum for p-polarised light, with this maximum in the range from 510 nm to 550 nm.

A chalcopyrite compound-based thin film in which an alkali metal is incorporated, and a method of fabricating the same are provided. The chalcopyrite compound-based thin film in which an alkali metal is incorporated may have improved film characteristics such as excellent chalcopyrite crystal characteristics and improved surface characteristics, and may exhibit improved optical characteristics by control of the distribution of constituent elements in the chalcopyrite compound layer. Accordingly, performance of a solar cell including the chalcopyrite compound-based thin film may be improved. The chalcopyrite compound-based thin film may be easily fabricated through a solution process.

Surface having properties for reducing diffuse light due to water condensation, wherein the antifog means consist in atomic aggregates adhered to and dispersed over the surface, wherein the aggregates are selected among the transition metals and the silicon. It is also related to a method for obtaining a surface having properties for reducing diffuse light due to water condensation a wavelength selected in the range from 100 nm to 50 micrometers, comprising the steps of selecting the wavelength, obtaining a glass or polymer surface that has been subjected to optical polishing and adhering to the surface atomic aggregates which are selected among the transition metals and the silicon with a separation between them being lower than or having an order of the selected wavelength selected. Thus a durable antifogging surface is obtained.