Disclosed herein are methods for forming a graphene film on a substrate, the methods comprising depositing graphene on a surface of the substrate by a first vapor deposition step to form a discontinuous graphene crystal layer; depositing a graphene oxide layer on the discontinuous graphene crystal layer to form a composite layer; and depositing graphene on the composite layer by a second vapor deposition step, wherein the graphene oxide layer is substantially reduced to a graphene layer during the second vapor deposition step. Transparent coated substrates comprising such graphene films are also disclosed herein, wherein the graphene films have a resistance of less than about 10 KΩ/sq.

The present disclosure relates to anti-fog coatings, coated substrate comprising an anti-fog coating and a process for preparing such coatings. Said process comprising exposing a surface to be coated in a plasma, said plasma produced by exposing a carrier gas comprising an oxidant (e.g. N.sub.2/O.sub.2, N.sub.2/N.sub.2O, or air) and a alkylcyclosiloxane (e.g. tetramethylcyclotetrasiloxane) under dielectric barrier discharge (DBD) in Townsend's mode at atmospheric pressure.

Low-cost and robust platforms are key for the development of next-generation 3D micro- and nanodevices. To fabricate such platforms, nanocrystalline diamond (NCD) is a highly appealing material due to its biocompatibility, robustness, and mechanical, electrical, electrochemical, and optical properties, while glass substrates with through vias are ideal interposers for 3D integration due to the excellent properties of glass. A low-cost process—free of photolithography and transfer printing—for fabricating arrays of TGVs that are sealed with suspended portions of an ultra-thin NCD film on one side is presented. These highly transparent structures may serve as a platform for the development of microwells for single-cell culture and analysis, 3D integrated devices such as microelectrodes, and quantum technologies. It is also possible to replace the NCD with silicon nitride or silicon carbide, allowing for the development of complex heterogeneous structures on a small scale.

A coating film-attached glass comprising a glass substrate, and a coating film provided on at least a part of a surface of the glass substrate, in which a region from the surface of the glass substrate on the coating film side to a predetermined depth is a modified layer, and the modified layer has a microcrystalline structure at least in part.

The present invention provides a hydrophobic surface coating and a preparation method therefor. The hydrophobic surface coating uses one or more fluorinated alcohol compounds as a reaction gas material, and is formed on a surface of a base body by a plasma-enhanced chemical vapor deposition method, to improve the hydrophobicity, the chemical resistance, and the weatherability of the surface of the base body.

A treated substrate includes a low emissivity coating layer disposed on a substrate and a high emissivity coating layer disposed on the low emissivity coating layer. The low emissivity coating layer is formed a low emissivity coating composition including silver, or indium tin oxide, or fluorine-doped tin oxide, while the high emissivity coating layer is formed from a high emissivity coating composition including a carbon-doped silicon oxide. The treated substrate has an emissivity of from 0.7 to less than 1.0 at wavelengths ranging from 8 micrometers to 13 micrometers and has an emissivity of greater than 0 to 0.3 at wavelengths less than 6 micrometers. The treated substrate also maintains a visually acceptable mechanical brush durability resistance for at least 150 test cycles tested in accordance with ASTM D2486-17.

A method of controllably bonding a thin sheet having a thin sheet bonding surface with a carrier having a carrier bonding surface, by depositing a carbonaceous surface modification layer onto at least one of the thin sheet bonding surface and the carrier bonding surface, incorporating polar groups with the surface modification layer, and then bonding the thin sheet bonding surface to the carrier bonding surface via the surface modification layer. The surface modification layer may include a bulk carbonaceous layer having a first polar group concentration and a surface layer having a second polar group concentration, wherein the second polar group concentration is higher than the first polar group concentration. The surface modification layer deposition and the treatment thereof may be performed by plasma polymerization techniques.

A composite pane having a functional element having electrically controllable optical properties, includes a stack sequence of an outer pane, a first intermediate layer, a second intermediate layer, and an inner pane, the intermediate layers containing a thermoplastic polymer film having a plasticizer, a functional element having electrically controllable optical properties is arranged, at least in sections, between the first and second intermediate layers, and the functional element is a polymer dispersed liquid crystal functional element and includes a second stack sequence of a first carrier film, an active layer, and a second carrier film. An exit surface of the active layer is sealed, at least in sections, on a lateral surface of the functional element by a barrier layer. The barrier layer substantially prevents the diffusion of plasticizer through the barrier layer, and is produced by a vacuum-based thin-film deposition method.

The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.

The present invention relates to: a method of manufacturing glass with hollow nanopillars, which includes a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate, a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the glass substrate, and a second etching step in which the glass substrate, on which the silicon oxide clusters are formed, is etched and hollow nanopillars are formed; and glass with hollow nanopillars manufactured thereby.