To provide a manufacturing method of a phase difference element which is superior in moisture resistance. After forming an optically anisotropic layer by way of oblique vapor deposition on a substrate, the optically anisotropic layer is covered by a protective layer made by depositing an inorganic compound by way of an atomic layer deposition method. More specifically, established is a manufacturing method of a phase difference element containing a transparent substrate, optically anisotropic layer containing a birefringent film and a protective layer, the method including: an optically anisotropic layer formation step of forming an optically anisotropic layer by forming a birefringent film by way of oblique vapor deposition; and a protective layer formation step of forming a protective layer by depositing an inorganic compound by way of an atomic layer deposition method.

A process for depositing a coating on a glass substrate includes co-sputtered simultaneously by a plasma, in one and the same chamber of the vacuum deposition device, a first constituent made of a material consisting of an oxide, a nitride or an oxynitride of a first element and a second constituent consisting of the metallic form of a second element. The process also includes introducing a hydride, a halide or an organic compound of a third element, different than the first element, into the plasma, to recover the substrate covered with the coating comprising the first, second and third elements at the outlet of the device. The coating consists of metal nanoparticles of the second element dispersed in an inorganic matrix of the first and third elements. The coating displays a plasmon absorption peak in the visible region.

A transparent structure may have structural layers such as an inner layer and an outer layer, which may be formed from glass. The transparent structure may be curved. At least one of the inner layer and the outer layer may be coated with an infrared reflection coating. The infrared reflection coating may be formed from multiple optical resonators. Each of the resonators may include two half-mirrors separated by a dielectric layer. The half-mirrors may include infrared reflective material, such as silver. At least some of the resonators may additionally include a getter layer. The getter layer may be formed from amorphous material, nanoparticles in dielectric material, or other desired material, and may protect the infrared reflective material while the infrared reflection coating is being deposited. Additionally, the getter layer may reduce the color shift exhibited by high angle light as it passes through the transparent structure.

Apparatus and methods for processing a glass sheet can include a coating chamber including a dispensing port to dispense a coating on a major surface of the glass sheet. In some embodiments, an apparatus can include a fog chamber including an enclosure, a fog generator to provide fog to the enclosure, and a passage in the enclosure from which fog can exit the enclosure to contact a major surface of the glass sheet. In some embodiments a method can include providing a glass sheet to a coating chamber, and dispensing a coating on a major surface of the glass sheet. In some embodiments, a method can include providing a glass sheet to a fog chamber, providing fog to an enclosure of the fog chamber, and contacting a major surface of the glass sheet with the fog by passing the fog from the enclosure through a passage in the enclosure.

Disclosed herein is method for fabricating a graphene layer on a non-graphene carbon layer including steps of cleaning and seeding a substrate, depositing a crystalline diamond on the substrate, sputtering an aluminum layer on the crystalline diamond, where the aluminum layer is greater than 5 nanometers and less than 50 nanometers; and treating a surface of the aluminum layer with an ion beam resulting in a graphene layer on the crystalline diamond.

Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

A medical glass container, a coat is formed on at least a part of an inner wall of the glass container, wherein the coat is a diamond-like carbon film that does not contain silicon.

Disclosed herein is method for fabricating a graphene layer on a non-graphene carbon layer including steps of cleaning and seeding a substrate, depositing a crystalline diamond on the substrate, sputtering an aluminum layer on the crystalline diamond, where the aluminum layer is greater than 5 nanometers and less than 50 nanometers; and treating a surface of the aluminum layer with an ion beam resulting in a graphene layer on the crystalline diamond.

A treated substrate includes a low emissivity coating layer disposed on a substrate and a high emissivity coating layer disposed on the low emissivity coating layer. The low emissivity coating layer is formed a low emissivity coating composition including silver, or indium tin oxide, or fluorine-doped tin oxide, while the high emissivity coating layer is formed from a high emissivity coating composition including a carbon-doped silicon oxide. The treated substrate has an emissivity of from 0.7 to less than 1.0 at wavelengths ranging from 8 micrometers to 13 micrometers and has an emissivity of greater than 0 to 0.3 at wavelengths less than 6 micrometers. The treated substrate also maintains a visually acceptable mechanical brush durability resistance for at least 150 test cycles tested in accordance with ASTM D2486-17.

The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.