A glazing unit includes a first pane and a second pane, which are connected to one another via a thermoplastic intermediate layer, a metal-based functional layer, which is deposited on an internal surface of the first pane facing the thermoplastic intermediate layer, a coating-free marginal region on the internal surface of the first pane, which is free of metal-based functional layer and extends from one side edge of the first pane over at least 1 mm to at most 5 mm on the internal surface, a protective layer, which, in the coating-free marginal region, is disposed directly on the internal surface of the first pane and, in an overlap region directly adjacent to the coating-free marginal region, is disposed on the metal-based functional layer.

A heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties, and methods to manufacture such a glazing. The glazing comprises a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.

The invention relates to heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties and methods to manufacture such glazing. They comprise a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide, preferably deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.

One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. In one or more embodiments, the interface exhibits an effective adhesion energy of about less than about 4 J/m.sup.2. In some embodiments, the interface is modified by the inclusion of a crack mitigating layer containing an inorganic material between the glass substrate and the film.

The invention relates to a glass substrate including a stack of coating layers having control properties, in which stack comprises at least one niobium metal layer located between a layer of a dielectric material selected from Si.sub.3N.sub.4 or TiOx and a layer of a protective metal material selected from TIN or NiCr, conferring solar control and heat resistance properties on the glass substrate.

The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (l.sub.ce) and a length (L.sub.ce) that are respectively smaller than the width (l.sub.e) and the length (L.sub.e) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.

The invention relates to a glass substrate including a stack of coating layers having control properties, in which stack comprises at least one niobium metal layer located between a layer of a dielectric material selected from Si.sub.3N.sub.4 or TiOx and a layer of a protective metal material selected from TIN or NiCr, conferring solar control and heat resistance properties on the glass substrate.

A layer-forming device that enables highly efficient layer formation and has a simplified configuration includes: a substrate feeding mechanism; a plasma-generating electrode; a space-partitioning wall; and a plurality of injectors. The plasma-generating electrode faces towards a feeding pathway of the substrate, and generates plasma using a reactive gas upon a supply of electric power. The space-partitioning wall is disposed between the feeding pathway and the plasma-generating electrode. A plurality of slit-shaped through-holes, through which radicals, ions generated from the plasma, or a portion of the plasma can pass, are formed at predetermined intervals in the space-partitioning wall. The plurality of injectors are sandwiched between the space-partitioning wall and the feeding pathway, such that each of the injectors is sandwiched between two adjacent through-holes from both sides of the two through-holes in the feeding direction, and the layer-forming gas is supplied toward the substrate through a layer-forming gas supply port.

A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm.sup.1 to 3800 cm.sup.1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

An ultrathin free-standing solid state membrane, including an etched well on a glass wafer, and a layer of SiX deposited on a backside of the etched well on the glass wafer.