Durable and scratch resistant articles including low-reflectance optical coating with gradient portion. In some embodiments, an article comprises: a substrate comprising a first major surface; and an optical coating disposed over the first major surface. The optical coating comprises: a second major surface; a thickness; and a first gradient portion. A refractive index of the optical coating varies along a thickness of the optical coating. The difference between the maximum refractive index of the first gradient portion and the minimum refractive index of the first gradient portion is 0.05 or greater. The absolute value of the slope of the refractive index of the first gradient portion is 0.1/nm or less everywhere along the thickness of the first gradient portion. The article exhibits a single side photopic average light reflectance of 3% or less, and a maximum hardness from 10 GPa to 30 GPa.

An article includes a glass substrate including two main faces defining two main surfaces separated by edges and a temporary protective layer comprising an organic polymer matrix deposited on at least one portion of a main surface of the glass substrate, wherein the temporary protective layer has a rough surface defined by a surface roughness parameter Sa, corresponding to the arithmetic mean height of the profile of the surface, of greater than 0.2 μm.

Disclosed are a precursor solution for a copper-zinc-tin-sulfur (CZTS) thin film solar cell, a preparation method therefor, and the use thereof. The present invention discloses two types of simple metal complexes which are capable of formulating a high-quality precursor solution.

Provided is a carrier-attached metal foil which can suppress the number of foreign matter particles on the surface of a metal layer to enhance circuit formability, and can keep stable releasability even after heating at a high temperature of 240° C. or higher (for example, 260° C.) for a long period of time. The carrier-attached metal foil includes a carrier, a release functional layer provided on the carrier, the release functional layer including a metal oxynitride, and a metal layer provided on the release functional layer.

Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized in that the optical film comprises cesium, tungsten, and oxygen, and a refractive index n and an extinction coefficient k of the optical film at each of wavelengths [300 nm, 350 nm, 400 nm, 450 nm, . . . , 1700 nm] specified at 50 nm intervals in a wavelength region from 300 nm to 1700 nm are set respectively within specified numerical ranges.

An antireflection structure comprising a transparent substrate having a plurality of holes with U-shaped or V-shaped cross-sectional shapes perpendicular to a flat surface portion and a metal oxide film disposed on the surface portion of the transparent substrate and in the space portions formed in an upward direction from the bottom portions of holes in the transparent substrate, wherein the average diameter of the openings of the holes is 50 nm to 300 nm, the average distance between the center points of openings of the adjacent holes is 100 nm to 400 nm, and the depth of each hole from the surface portion of the substrate is 80 nm to 250 nm; and the thickness of the metal oxide film disposed in each of the space portions increases as the depth of each of the holes becomes larger, thereby reducing the difference in depth between the holes from the uppermost surface portion of the metal oxide film disposed on the surface portion to the surface portions of the metal oxide films in the space portions.

A glass article having anti-sun properties includes a glass substrate having a stack of layers, which includes, successively from the surface of the substrate: a first module M.sub.1 having a layer based on a dielectric material with a thickness e.sub.1 or of a set of layers, a layer TN.sub.1 including titanium nitride with a thickness of between 2 nanometers and 80 nanometers, a second module M.sub.2 including a layer based on a dielectric material with a thickness e.sub.2 or of a set of layers based on dielectric materials with a cumulative thickness e.sub.2, an intermediate layer including at least one element selected from silicon, aluminum, titanium or a mixture of at least two of these elements is deposited between the layer TN.sub.1 and the first module M.sub.1 and/or between the layer TN.sub.1 and the second module M.sub.2, the intermediate layer having a thickness of between 0.2 nm and 6 nm.

A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.

A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a carbon-based upper protective layer within which the carbon atoms are essentially in an sp.sup.2 hybridization state and the upper protective layer is deposited above at least a part of the functional layer and exhibits a thickness of less than 1 nm.

The present document discloses a glazing in the form of a window glass or vehicle glass which comprises a transparent glass substrate, and a coating, which comprises at least one functional metal Ag alloy coating layer. The alloy coating layer consists essentially of Ag with an alloying agent selected from a group consisting of Mg, Al, Si, Ca, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Zr, Nb, Mo, In, Sn, Hf, Ta or W. An alloying agent concentration is 0.15-1.35 at. %, preferably 0.20-1.00 at. % or 0.25-0.80 at. % of the Ag alloy coating layer, the rest being Ag, and the Ag alloy coating layer has a thickness of 5-20 nm, preferably 8-15 nm or more preferably 8-12 nm.