The invention relates to a glass substrate for chemical strengthening where a surface is coated by magnetron sputtering with a temporary thin film that reduces the extent of ion exchange upon chemical strengthening and where the temporary thin film can be removed after the chemical strengthening by treatment with an etchant solution. Other embodiments relate to a method for making a chemically strengthened glass substrate with controlled curvature comprising: providing a substrate with opposed surfaces that are durable to a given etchant solution, forming a temporary thin film upon at least part of a surface of the glass substrate, chemically strengthening the glass substrate bearing the temporary thin film, and removing the temporary thin film after said chemical strengthening with said etchant solution. The thickness of the temporary thin film is chosen such that a controlled curvature is obtained upon chemical strengthening.

Disclosed herein are glass articles and methods of manufacturing the same. The glass articles may include a glass layer comprising a first portion having a first thickness, a second portion having a second thickness, and a third portion disposed in between the first portion and the second portion. The third portion may form a living hinge. The living hinge may comprise a plurality of indentations such that a majority of the third portion has a third thickness that is less than the first thickness and the second thickness. In addition, the living hinge may comprise a plurality of protrusions such that a majority of the third portion has a third thickness that is greater than the first thickness and the second thickness.

Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

An optical member including a porous glass layer on a base member is provided, wherein the reflectance is reduced and a ripple is suppressed. The optical member is provided with a base member and a glass layer holding a transparent material in the inside of a porous structure disposed on the base member, wherein in the thickness direction of the glass layer, the porosity in the base member side with respect to the center line of the glass layer in the thickness direction is smaller than the porosity in the side opposite to the base member with respect to the center line of the glass layer in the thickness direction.

A method to transfer a layer of harder thin film substrate onto a softer, flexible substrate. In particular, the present invention provides a method to deposit a layer of sapphire thin film on to a softer and flexible substrate e.g. quartz, fused silica, silicon, glass, toughened glass, PET, polymers, plastics, paper and fabrics. This combination provides the hardness of sapphire thin film to softer flexible substrates.

Described herein are organosilicon modification layers and associated deposition methods and inert gas treatments that may be applied on a sheet, a carrier, or both, to control van der Waals, hydrogen and covalent bonding between a sheet and carrier. The modification layers bond the sheet and carrier together such that a permanent bond is prevented at high temperature processing as well as maintaining a sufficient bond to prevent delamination during high temperature processing.

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.

In a method of fabricating a cover window, the method includes: forming, on a glass article having a flat upper surface, a mask layer including water glass and a recess portion having a partially recessed upper surface; and etching the mask layer and the glass article to form a cover window having a partially recessed upper surface.

Disclosed are a method for producing an optical thin film having a low refractive index, a thin film forming material, an optical thin film, and an optical member. The method for producing an optical thin film includes forming a vapor deposition film by depositing a thin film forming material on an object in a non-oxidizing atmosphere by a physical vapor deposition method; and bringing the vapor deposition film into contact with a first acidic solution comprising an acidic substance in a range of pH 2.5 or more and pH 3.5 or less to obtain a first thin film having voids, wherein the thin film forming material is a mixture comprising indium oxide and silicon oxide, in which the indium oxide is in a range of 0.230 mol or more and 0.270 mol or less with respect to 1 mol of the silicon oxide.

A method for fabricating a structured surface, includes: providing a transparent substrate; disposing a dewettable film over the substrate; annealing the dewettable film to form a plurality of islands; forming a coating over the plurality of islands; and etching the plurality of islands to form a structured array of surface features in the coating. A structured polymer and/or structured glass, includes: a structured array of surface features, such that the structured array of surface features has at least one dimension in a range of 0.5 nm to 5000 nm.