Patent classifications
C04B14/066
GRANULAR MIXED OXIDE MATERIAL AND THERMAL INSULATING COMPOSITION ON ITS BASIS
Hydrophobized granular material comprising from 30 to 95% by weight of a pyrogenic mixed oxide based on silica and at least one oxide of metal M selected from of Al, Ti and Fe with the content of metal M oxide in the mixed oxide being from 01 to 10% by weight, and from 5 to 70% by weight of at least one IR-opacifier selected from the group consisting of silicon carbide, zirconium dioxide, ilmenites, iron titanates, zirconium silicates, manganese oxides, graphites, carbon blacks and mixtures thereof.
PROCESS FOR HYDROPHOBIZING SHAPED INSULATION-MATERIAL BODIES BASED ON SILICA AT AMBIENT PRESSURE
The present invention relates to a process for producing a hydrophobized shaped thermal-insulation body, comprising pressing or compacting a thermal-insulation mixture containing a silica, an IR opacifier, an organosilicon compound A and an organosilicon compound B, wherein organosilicon compound A is hexamethyldisilazane (HMDS) and organosilicon compound B corresponds to a substance of the formula R.sub.nSiX.sub.4-n, where R=hydrocarbyl radical having 1 to 18 carbon atoms, n=0, 1 or 2, X=Cl, Br or alkoxy group —OR.sup.1 where R.sup.1=hydrocarbyl radical having 1 to 8 carbon atoms, or organosilicon compound B corresponds to a silanol of the formula HO[—Si(CH.sub.3).sub.2O—].sub.mH, where m=2-100.
PROCESS FOR HYDROPHOBIZING SHAPED INSULATION-MATERIAL BODIES BASED ON SILICA AT AMBIENT PRESSURE
The present invention relates to a process for producing a hydrophobized shaped thermal-insulation body, comprising pressing or compacting a thermal-insulation mixture containing a silica, an IR opacifier, an organosilicon compound A and an organosilicon compound B, wherein organosilicon compound A is hexamethyldisilazane (HMDS) and organosilicon compound B corresponds to a substance of the formula R.sub.nSiX.sub.4-n, where R=hydrocarbyl radical having 1 to 18 carbon atoms, n=0, 1 or 2, X=Cl, Br or alkoxy group —OR.sup.1 where R.sup.1=hydrocarbyl radical having 1 to 8 carbon atoms, or organosilicon compound B corresponds to a silanol of the formula HO[—Si(CH.sub.3).sub.2O—].sub.mH, where m=2-100.
Method for producing a TEMPOL-containing urethane resin composition having an improved storage stability
A method is useful for producing a urethane(meth)acrylate resin composition. The method improves storage stability and reduces the reactivity drift of the composition compared to compositions made by other means from the same starting materials. In particular, it reduces the degradation of TEMPOL in mixtures with branched urethane resins.
Method for producing a TEMPOL-containing urethane resin composition having an improved storage stability
A method is useful for producing a urethane(meth)acrylate resin composition. The method improves storage stability and reduces the reactivity drift of the composition compared to compositions made by other means from the same starting materials. In particular, it reduces the degradation of TEMPOL in mixtures with branched urethane resins.
THERMAL INSULATING COMPOSITION BASED ON FUMED SILICA GRANULATES, PROCESSES FOR ITS PREPARATION AND USES THEREOF
The present invention relates to a thermal insulating composition, containing 5 to 60% by weight of a hydrophobized granular material comprising fumed silica and at least one IR-opacifier, and 40 to 95% by weight of an inorganic and/or an organic binder, whereby the hydrophobized granular material has a content of free hydroxyl groups of no greater than 0.12 mmol/g, as determined by the reaction with lithium aluminium hydride.
THERMAL INSULATING COMPOSITION BASED ON FUMED SILICA GRANULATES, PROCESSES FOR ITS PREPARATION AND USES THEREOF
The present invention relates to a thermal insulating composition, containing 5 to 60% by weight of a hydrophobized granular material comprising fumed silica and at least one IR-opacifier, and 40 to 95% by weight of an inorganic and/or an organic binder, whereby the hydrophobized granular material has a content of free hydroxyl groups of no greater than 0.12 mmol/g, as determined by the reaction with lithium aluminium hydride.
HIGH TEMPERATURE OXIDATION PROTECTION FOR COMPOSITES
An oxidation protection system disposed on a substrate is provided, which may comprise a base layer comprising a first pre-slurry composition comprising a first phosphate glass composition, and/or a sealing layer comprising a second pre-slurry composition comprising a second phosphate glass composition and a strengthening compound comprising boron nitride, a metal oxide, and/or silicon carbide.
HIGH TEMPERATURE OXIDATION PROTECTION FOR COMPOSITES
An oxidation protection system disposed on a substrate is provided, which may comprise a base layer comprising a first pre-slurry composition comprising a first phosphate glass composition, and/or a sealing layer comprising a second pre-slurry composition comprising a second phosphate glass composition and a strengthening compound comprising boron nitride, a metal oxide, and/or silicon carbide.
High temperature oxidation protection for composites
An oxidation protection system disposed on a substrate is provided, which may comprise a base layer comprising a first pre-slurry composition comprising a first phosphate glass composition, and/or a sealing layer comprising a second pre-slurry composition comprising a second phosphate glass composition and a strengthening compound comprising boron nitride, a metal oxide, and/or silicon carbide.