A thermally conductive resin filler including a sintered body containing at least magnesium oxide, calcium oxide, and silicon oxide, the thermally conductive filler being characterized in that, when the molar number of calcium element contained in the total composition of the sintered body in terms of calcium oxide (CaO) is defined as MCa, and the molar number of silicon element contained in the total composition of the sintered body in terms of silicon oxide (SiO.sub.2) is defined as MSi, the molar ratio of the calcium oxide (CaO) to the silicon oxide (SiO.sub.2) represented by MCa/MSi is in the range of 0.1 or more and less than 2.0.

A thermally conductive resin filler including a sintered body containing at least magnesium oxide, calcium oxide, and silicon oxide, the thermally conductive filler being characterized in that, when the molar number of calcium element contained in the total composition of the sintered body in terms of calcium oxide (CaO) is defined as MCa, and the molar number of silicon element contained in the total composition of the sintered body in terms of silicon oxide (SiO.sub.2) is defined as MSi, the molar ratio of the calcium oxide (CaO) to the silicon oxide (SiO.sub.2) represented by MCa/MSi is in the range of 0.1 or more and less than 2.0.

A sputtering target which is made of a magnesium oxide sintered body having a purity of not less than 99.99% or not less than 99.995% by mass %, a relative density of not less than 98%, and an average grain size of not more than 8 μm. The average grain size of the sputtering target is preferably not more than 5 μm, more preferably not more than 2 μm. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.

A sputtering target which is made of a magnesium oxide sintered body having a purity of not less than 99.99% or not less than 99.995% by mass %, a relative density of not less than 98%, and an average grain size of not more than 8 μm. The average grain size of the sputtering target is preferably not more than 5 μm, more preferably not more than 2 μm. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.

A sintering-free inorganic ceramic brick-plate and its preparation method are disclosed. The sintering-free inorganic ceramic brick-plate includes following components by mass parts: 25-40 parts of magnesium oxide; 20-35 parts of magnesium chloride; 20-30 parts of fumed silica; 10-20 parts straw powders; 0.1-0.3 parts of graphene powders with a particle size of 2000 meshes; and 0.2-0.4 parts of airgel powders with a particle size of 100 nm. Compared with the prior art, the present invention utilizes a variety of raw natural non-toxic natural mineral raw materials, namely, the graphene powders with the particle size of 2000 meshes and the airgel powders with the particle size of 100 nm for mixing, and then the mixed raw materials can be solidified at room temperature and form sheets, and then the surface of the sheets is processed through printing or spraying glaze, so as to achieve the effect of high-grade tiles and natural marble.

A sintering-free inorganic ceramic brick-plate and its preparation method are disclosed. The sintering-free inorganic ceramic brick-plate includes following components by mass parts: 25-40 parts of magnesium oxide; 20-35 parts of magnesium chloride; 20-30 parts of fumed silica; 10-20 parts straw powders; 0.1-0.3 parts of graphene powders with a particle size of 2000 meshes; and 0.2-0.4 parts of airgel powders with a particle size of 100 nm. Compared with the prior art, the present invention utilizes a variety of raw natural non-toxic natural mineral raw materials, namely, the graphene powders with the particle size of 2000 meshes and the airgel powders with the particle size of 100 nm for mixing, and then the mixed raw materials can be solidified at room temperature and form sheets, and then the surface of the sheets is processed through printing or spraying glaze, so as to achieve the effect of high-grade tiles and natural marble.

The present disclosure relates to casting cores. The teachings thereof may be embodied in methods for producing a slip and components produced using such methods. For example, a method for producing a slip may include: mixing at least one inorganic constituent with at least one binder, wherein the binder comprises at least one epoxy resin and at least one silicone copolymer.

A ceramic substrate is formed of a polycrystalline ceramic and has a supporting main surface. The supporting main surface has a roughness of 0.01 nm or more and 3.0 nm or less in terms of Sa. The number of projections and depressions with a height of 1 nm or more in a square region with 50 μm sides on the supporting main surface is less than 5 on average, and the number of projections and depressions with a height of 2 nm or more in the square region is less than 1 on average.

A dielectric thin film containing MgO as a main component, wherein the dielectric thin film is composed of a columnar structure group containing at least one columnar structure A constructed by single crystal and at least one columnar structure B constructed by polycrystal, respectively, and in the cross section of the direction perpendicular to the dielectric thin film, when the area occupied by the columnar structure A is set as C.sub.A and the area occupied by the columnar structure B is set as C.sub.B, the relationship between C.sub.A and C.sub.B satisfies 0.4≦C.sub.B/C.sub.A≦1.1.

A method for producing a three-dimensionally shaped object by stacking layers includes forming each layer using a three-dimensional shape composition containing particles, measuring the thickness of the layer, and ejecting onto the layer a liquid binder containing a binding agent capable of binding the particles. For the ejecting, the amount of the liquid binder to be ejected per unit area of the layer when viewed from above is adjusted according to the result of the measuring.