Patent classifications
C04B41/4531
PART MADE OF SILICON-BASED CERAMIC OR CMC AND METHOD FOR PRODUCING SUCH A PART
The invention relates to a part made of silicon-based ceramic material or silicon-based ceramic matrix composite (CMC) material comprising an environmental barrier coating (EBC), said coating (12, 13) comprising a bonding layer (12) deposited on the surface of the ceramic material or ceramic matrix composite (CMC), said bonding layer (12) being topped by one or more layers together forming a multifunctional barrier structure (13), characterised in that the bonding layer (12) has at its interface with the multifunctional structure a polycrystalline silica layer (12) or sub-layer (12b).
TANTALUM CARBIDE COATED CARBON MATERIAL
The present invention relates to a tantalum carbide coated carbon material, and more particularly, to a tantalum carbide coated carbon material including a tantalum carbide film having a surface contact angle of 50° or more and low surface energy.
TANTALUM CARBIDE COATED CARBON MATERIAL
The present invention relates to a tantalum carbide coated carbon material, and more particularly, to a tantalum carbide coated carbon material including a tantalum carbide film having a surface contact angle of 50° or more and low surface energy.
TANTALUM CARBIDE-COATED CARBON MATERIAL AND METHOD FOR MANUFACTURING SAME
The present disclosure relates to a tantalum carbide-coated carbon material and a method for manufacturing the same, and an aspect of the present disclosure provides a tantalum carbide-coated carbon material including: a carbon substrate; and a tantalum carbide coating layer formed on the carbon substrate by a CVD method, wherein microcracks included in the tantalum carbide coating layer have a maximum width of 1.5 μm to 2.6 μm.
TANTALUM CARBIDE-COATED CARBON MATERIAL AND METHOD FOR MANUFACTURING SAME
The present disclosure relates to a tantalum carbide-coated carbon material and a method for manufacturing the same, and an aspect of the present disclosure provides a tantalum carbide-coated carbon material including: a carbon substrate; and a tantalum carbide coating layer formed on the carbon substrate by a CVD method, wherein microcracks included in the tantalum carbide coating layer have a maximum width of 1.5 μm to 2.6 μm.
ELECTROSTATIC CHUCK WITH CERAMIC MONOLITHIC BODY
An electrostatic chuck for a substrate processing system includes a monolithic body made of ceramic. A plurality of first electrodes are arranged in the monolithic body adjacent to a top surface of the monolithic body and that are configured to selectively receive a chucking signal. A gas channel is formed in the monolithic body and is configured to supply back side gas to the top surface. Coolant channels are formed in the monolithic body and are configured to receive fluid to control a temperature of the monolithic body.
METHOD FOR MANUFACTURING A COMPOSITE COMPONENT OF A TIMEPIECE OR OF A JEWELRY PART, AND COMPOSITE COMPONENT OBTAINABLE BY SUCH METHOD
The invention relates to a method for manufacturing a composite component of a timepiece or of a jewelry part, the composite component comprising a porous ceramic part and a metallic material filling the pores of said ceramic part, said method comprising the steps of: providing a porous ceramic preform of the component, providing a metallic material, heating the metallic material to a temperature higher than the melting point of the metallic material, filling the pores of the ceramic preform with the molten metallic material, cooling the metallic material and the ceramic preform to obtain a solidified metallic material in the pores of the ceramic preform, and applying finishing treatments to obtain the composite component,
wherein said porous ceramic preform consists essentially of a material selected from the group consisting of Si.sub.3N.sub.4, SiO.sub.2 and mixtures thereof, and said metallic material is selected from the group consisting of gold, platinum, palladium metals and alloys of these metals.
The invention relates also to a composite component of a timepiece or of a jewelry part comprising a porous ceramic part and a metallic material filling the pores of said ceramic part, wherein said porous ceramic part consists essentially of a material selected from the group consisting of Si.sub.3N.sub.4, SO.sub.2 and mixtures thereof, and said metallic material which is selected from the group consisting of gold, platinum, palladium metals and alloys of these metals.
ADAPTIVE SURFACE TEXTURING FOR CERAMIC MATRIX COMPOSITES
An adaptive surface texturing method is provided for use with a part formed of ceramic matrix composites (CMCs) to be coated with an environmental barrier coating (EBC). The method includes coating a CMC surface of the part with an initial coating, determining a contour and an undulation pattern of the CMC surface and designing a texturing pattern to follow the contour and the undulation pattern and to be formed in the initial coating based on a thickness of the initial coating and an average particle size of a slurry of the EBC.
ADAPTIVE SURFACE TEXTURING FOR CERAMIC MATRIX COMPOSITES
An adaptive surface texturing method is provided for use with a part formed of ceramic matrix composites (CMCs) to be coated with an environmental barrier coating (EBC). The method includes coating a CMC surface of the part with an initial coating, determining a contour and an undulation pattern of the CMC surface and designing a texturing pattern to follow the contour and the undulation pattern and to be formed in the initial coating based on a thickness of the initial coating and an average particle size of a slurry of the EBC.
CERAMIC MATRIX COMPOSITE SURFACE ROUGHNESS
A method of improving surface roughness of ceramic matrix composites (CMCs) is provided. The method includes completing a formation of the CMCs and a chemical vapor infiltration (CVI) process to initially coat the CMCs, inspecting a CMC surface, identifying, from a result of the inspecting, a defect in the CMC surface that negatively impacts a surface roughness characteristic thereof, locally targeting and ablating the defect and re-inspecting the CMC surface to ensure that the defect is correct.