Patent classifications
C04B41/5041
Photocatalytic ceramic
The present invention relates to a method for producing an antibacterial photocatalytic ceramic that comprises: making available amorphous Ti; making available a biomimetic material or a biomaterial based on calcium phosphate; functionalizing said biomimetic material or said biomaterial based on calcium phosphate, with said amorphous Ti, obtaining a functionalized and oriented composite; adding said functionalized composite to a ceramic mixture, and/or applying said functionalized composite on a ceramic semi-finished product, where ceramic semi-finished product means the ceramic material before baking; applying said functionalized composite on a ceramic semi-finished product; baking at a temperature between 600 and 1400° C., preferably between 900 and 1300° C., for a time that varies from 20 to 500 minutes, obtaining an antibacterial photocatalytic ceramic. The present invention further relates to a photocatalytic ceramic material that comprises a biomimetic material having a nanostructured hierarchical structure with macro and micro cavities, within which TiO.sub.2 is included in the crystalline form of rutile, and tiles, sanitary ware and tableware comprising same.
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING THE SAME
An electrostatic chuck is provided, the electrostatic chuck includes a base; and an insulating layer, an electrode layer, a first dielectric layer, and a second dielectric layer sequentially stacked on the base. The first dielectric layer is aluminum oxide (Al.sub.2O.sub.3) or aluminum nitride (AlN). A material of the second dielectric layer is different from a material of the first dielectric layer, and the second dielectric layer includes titanium element, IVA group element, and oxygen element.
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING THE SAME
An electrostatic chuck is provided, the electrostatic chuck includes a base; and an insulating layer, an electrode layer, a first dielectric layer, and a second dielectric layer sequentially stacked on the base. The first dielectric layer is aluminum oxide (Al.sub.2O.sub.3) or aluminum nitride (AlN). A material of the second dielectric layer is different from a material of the first dielectric layer, and the second dielectric layer includes titanium element, IVA group element, and oxygen element.
NANO-MODIFIED MATERIAL FOR CAVITY WALL WITH INSULATION FOR PREFABRICATED BUILDING, AND PREPARATION METHOD AND USE THEREOF
A nano-modified material for cavity wall with insulation for prefabricated building, preparation method and application thereof, belonging to the technical field of building materials. The material includes splicing structures and a nano-modified silane waterproof coating, wherein the splicing structure includes a recycled concrete structure layer and a nano-modified foam concrete thermal insulation core layer, the recycled concrete structure layer is a hollow cuboid structure with openings at both ends, the nano-modified foam concrete thermal insulation core layer is a structure formed by casting inside the recycled concrete structure layer, and the nano-modified silane waterproof coating is applied at a butt joint of two of the splicing structures.
NANO-MODIFIED MATERIAL FOR CAVITY WALL WITH INSULATION FOR PREFABRICATED BUILDING, AND PREPARATION METHOD AND USE THEREOF
A nano-modified material for cavity wall with insulation for prefabricated building, preparation method and application thereof, belonging to the technical field of building materials. The material includes splicing structures and a nano-modified silane waterproof coating, wherein the splicing structure includes a recycled concrete structure layer and a nano-modified foam concrete thermal insulation core layer, the recycled concrete structure layer is a hollow cuboid structure with openings at both ends, the nano-modified foam concrete thermal insulation core layer is a structure formed by casting inside the recycled concrete structure layer, and the nano-modified silane waterproof coating is applied at a butt joint of two of the splicing structures.
HONEYCOMB STRUCTURE AND MANUFACTURING METHOD OF THE SAME
A honeycomb structure includes a pillar-shaped honeycomb structure body having a porous partition wall so as to surround a plurality of cells extending from a first end face to a second end face, and a circumferential coating layer composed of a circumferential coating material coated on at least a part of circumference of the honeycomb structure body, wherein the circumferential coating layer has a printing area for printing on the surface thereof, the printing area has a lightness (L*) in L*a*b* color space (CIE1976) defined by International Commission on Illumination (CIE) of 35 or more, and the printing area has a surface roughness Ra of 30 μm or less.
HONEYCOMB STRUCTURE AND MANUFACTURING METHOD OF THE SAME
A honeycomb structure includes a pillar-shaped honeycomb structure body having a porous partition wall so as to surround a plurality of cells extending from a first end face to a second end face, and a circumferential coating layer composed of a circumferential coating material coated on at least a part of circumference of the honeycomb structure body, wherein the circumferential coating layer has a printing area for printing on the surface thereof, the printing area has a lightness (L*) in L*a*b* color space (CIE1976) defined by International Commission on Illumination (CIE) of 35 or more, and the printing area has a surface roughness Ra of 30 μm or less.
Porous support, method for manufacturing porous support, separation membrane structure, and method for manufacturing separation membrane structure
A porous support includes a base body, a supporting layer, and a topmost layer. The supporting layer is disposed between the base body and the topmost layer, and makes contact with the topmost layer. A ratio of a porosity of the topmost layer to a porosity of the supporting layer is greater than or equal to 1.08. A ratio of a thickness of the topmost layer to a thickness of the supporting layer is less than or equal to 0.9.
Porous support, method for manufacturing porous support, separation membrane structure, and method for manufacturing separation membrane structure
A porous support includes a base body, a supporting layer, and a topmost layer. The supporting layer is disposed between the base body and the topmost layer, and makes contact with the topmost layer. A ratio of a porosity of the topmost layer to a porosity of the supporting layer is greater than or equal to 1.08. A ratio of a thickness of the topmost layer to a thickness of the supporting layer is less than or equal to 0.9.
HIGH TEMPERATURE OXIDATION PROTECTION FOR COMPOSITES
An oxidation protection system disposed on a substrate is provided, which may comprise a base layer comprising a first pre-slurry composition comprising a first phosphate glass composition, and/or a sealing layer comprising a second pre-slurry composition comprising a second phosphate glass composition and a strengthening compound comprising boron nitride, a metal oxide, and/or silicon carbide.