C04B41/5045

Methods for coating a component

A method for processing a component is provided and includes masking a first portion of the component with a maskant. The maskant includes a slurry having a plurality of particles in a fluid carrier. The plurality of particles comprises at least one of silicon, carbon, one or more rare earth disilicates, monosilicates or oxides, and combinations thereof. The method includes depositing a silicon-based coating on a second portion of the component via a chemical vapor deposition process and removing the maskant and any overlying silicon-based coating from the first portion of the component.

METHODS OF FABRICATING OXIDE/METAL COMPOSITES AND COMPONENTS PRODUCED THEREBY
20220411336 · 2022-12-29 ·

Methods for producing oxide/metal composite components for use in high temperature systems, and components produced thereby. The methods use a fluid reactant and a porous preform that contains a solid oxide reactant. The fluid reactant contains yttrium as a displacing metal and the solid oxide reactant of the preform contains niobium oxide, of which niobium cations are displaceable species. The preform is infiltrated with the fluid reactant to react its yttrium with the niobium oxide of the solid oxide reactant and produce an yttria/niobium composite component, during which yttrium at least partially replaces the niobium cations of the solid oxide reactant to produce yttria and niobium metal, which together define a reaction product. The pore volume of the preform is at least partially filled by the reaction product, whose volume is greater than the volume lost by the solid oxide reactant as a result of reacting yttrium and niobium oxide.

METHODS OF FABRICATING OXIDE/METAL COMPOSITES AND COMPONENTS PRODUCED THEREBY
20220411336 · 2022-12-29 ·

Methods for producing oxide/metal composite components for use in high temperature systems, and components produced thereby. The methods use a fluid reactant and a porous preform that contains a solid oxide reactant. The fluid reactant contains yttrium as a displacing metal and the solid oxide reactant of the preform contains niobium oxide, of which niobium cations are displaceable species. The preform is infiltrated with the fluid reactant to react its yttrium with the niobium oxide of the solid oxide reactant and produce an yttria/niobium composite component, during which yttrium at least partially replaces the niobium cations of the solid oxide reactant to produce yttria and niobium metal, which together define a reaction product. The pore volume of the preform is at least partially filled by the reaction product, whose volume is greater than the volume lost by the solid oxide reactant as a result of reacting yttrium and niobium oxide.

SI-BASED COMPOSITE BOND COAT CONTAINING CRISTOBALITE MODIFIER FOR ENVIRONMENTAL BARRIER COATINGS
20230339821 · 2023-10-26 · ·

A Si-based composite bond coat for environmental barrier coatings on a Si-based ceramic matrix composite that protects the CMC from an oxidation environment by in-situ modifying a thermally grown oxide (TGO) using a TGO modifier to suppress cristobalite TGO cracking during thermal cycling in a gas turbine engine.

Plasma processing device member, plasma processing device comprising said plasma processing device member, and method for manufacturing plasma processing device member

A plasma processing device member according to the disclosure includes a base material and a film formed of an oxide, or fluoride, or oxyfluoride, or nitride of a rare-earth element, the film being disposed on at least part of the base material, the film including a surface to be exposed to plasma, the surface having an area occupancy of open pores of 8% by area or more, and an average diameter of open pores of 8 μm or less.

Plasma processing device member, plasma processing device comprising said plasma processing device member, and method for manufacturing plasma processing device member

A plasma processing device member according to the disclosure includes a base material and a film formed of an oxide, or fluoride, or oxyfluoride, or nitride of a rare-earth element, the film being disposed on at least part of the base material, the film including a surface to be exposed to plasma, the surface having an area occupancy of open pores of 8% by area or more, and an average diameter of open pores of 8 μm or less.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF.sub.3, Er.sub.4Al.sub.2O.sub.9, ErAlO.sub.3, and a ceramic compound comprising Y.sub.4Al.sub.2O.sub.9 and a solid-solution of Y.sub.2O.sub.3—ZrO.sub.2.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF.sub.3, Er.sub.4Al.sub.2O.sub.9, ErAlO.sub.3, and a ceramic compound comprising Y.sub.4Al.sub.2O.sub.9 and a solid-solution of Y.sub.2O.sub.3—ZrO.sub.2.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.