C04B41/5045

SANITARY WARE

Disclosed is a sanitary ware having not only a practical antivirus property but also a property which allows a pollution to be difficultly attached to, and to be easily removed from the sanitary ware. A sanitary ware comprising a pottery substrate and a glaze layer formed on a surface of the pottery substrate, wherein the glaze layer contains a metal element as an antivirus agent, and the metal element is present in a state of a spinodal phase separation in at least a surface region of the glaze layer, has a practical antivirus property as well as a property which allows a pollution to be difficultly attached to, and to be easily removed from, the sanitary ware.

SANITARY WARE

Disclosed is a sanitary ware having not only a practical antivirus property but also a property which allows a pollution to be difficultly attached to, and to be easily removed from the sanitary ware. A sanitary ware comprising a pottery substrate and a glaze layer formed on a surface of the pottery substrate, wherein the glaze layer contains a metal element as an antivirus agent, and the metal element is present in a state of a spinodal phase separation in at least a surface region of the glaze layer, has a practical antivirus property as well as a property which allows a pollution to be difficultly attached to, and to be easily removed from, the sanitary ware.

Plasma processing device member and plasma processing device provided with same

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

Plasma processing device member and plasma processing device provided with same

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

AL2O3-BASED CERAMIC WELDING SEALING COMPONENT AND PREPARATION METHOD THEREOF

The present invention discloses an Al.sub.2O.sub.3-based ceramic welding sealing component and a preparation method thereof, and relates to the technical field of metalized ceramic processing. The Al.sub.2O.sub.3-based ceramic welding sealing component disclosed in the present invention comprises a ceramic matrix and a metallized layer. The ceramic matrix is made from raw materials such as an inorganic fiber-aluminum oxide 3D network matrix, yttrium oxide, silicon oxide, titanium oxide, an additive, a binder and a dispersant, through steps such as preparation of the inorganic fiber-aluminum oxide 3D network matrix, mixing, pelletizing, primary sintering and secondary sintering; and the raw materials of the metallized layer comprise titanium powder, tungsten powder, molybdenum oxide, boron oxide, yttrium oxide and an organic binder. Al.sub.2O.sub.3-based ceramic welding sealing component provided by the present invention has high efficiency of space filling and tensile strength, excellent tensile strength, toughness and high-temperature resistance.

AL2O3-BASED CERAMIC WELDING SEALING COMPONENT AND PREPARATION METHOD THEREOF

The present invention discloses an Al.sub.2O.sub.3-based ceramic welding sealing component and a preparation method thereof, and relates to the technical field of metalized ceramic processing. The Al.sub.2O.sub.3-based ceramic welding sealing component disclosed in the present invention comprises a ceramic matrix and a metallized layer. The ceramic matrix is made from raw materials such as an inorganic fiber-aluminum oxide 3D network matrix, yttrium oxide, silicon oxide, titanium oxide, an additive, a binder and a dispersant, through steps such as preparation of the inorganic fiber-aluminum oxide 3D network matrix, mixing, pelletizing, primary sintering and secondary sintering; and the raw materials of the metallized layer comprise titanium powder, tungsten powder, molybdenum oxide, boron oxide, yttrium oxide and an organic binder. Al.sub.2O.sub.3-based ceramic welding sealing component provided by the present invention has high efficiency of space filling and tensile strength, excellent tensile strength, toughness and high-temperature resistance.

Automated preparation method of a SiC.SUB.f./SiC composite flame tube
11591267 · 2023-02-28 · ·

An automated preparation method of a SiC.sub.f/SiC composite flame tube, comprising the following steps: preparing an interface layer for a SiC fiber by a chemical vapor infiltration process, and obtaining the SiC fiber with a continuous interface layer; laying a unidirectional tape on the SiC fiber with the continuous interface layer and winding the SiC fiber with the continuous interface layer to form and obtaining a preform of a net size molding according to a fiber volume and a fiber orientation obtained in a simulation calculation; and adopting a reactive melt infiltration process and the chemical vapor infiltration process successively for a densification and obtaining a high-density SiC.sub.f/SiC composite flame tube in a full intelligent way. The SiC.sub.f/SiC composite flame tube prepared by the present disclosure not only has a high temperature resistance, but also has a low thermal expansion coefficient, high thermal conductivity and high thermal shock resistance.

Automated preparation method of a SiC.SUB.f./SiC composite flame tube
11591267 · 2023-02-28 · ·

An automated preparation method of a SiC.sub.f/SiC composite flame tube, comprising the following steps: preparing an interface layer for a SiC fiber by a chemical vapor infiltration process, and obtaining the SiC fiber with a continuous interface layer; laying a unidirectional tape on the SiC fiber with the continuous interface layer and winding the SiC fiber with the continuous interface layer to form and obtaining a preform of a net size molding according to a fiber volume and a fiber orientation obtained in a simulation calculation; and adopting a reactive melt infiltration process and the chemical vapor infiltration process successively for a densification and obtaining a high-density SiC.sub.f/SiC composite flame tube in a full intelligent way. The SiC.sub.f/SiC composite flame tube prepared by the present disclosure not only has a high temperature resistance, but also has a low thermal expansion coefficient, high thermal conductivity and high thermal shock resistance.

Chemistry compatible coating material for advanced device on-wafer particle performance

A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.

Chemistry compatible coating material for advanced device on-wafer particle performance

A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.