Provided are halogen-free coatings, and methods for making and using such halogen-free coatings, for water and oil protection or repellants, which coatings control and/or eliminate the effect of humidity and oily substances on one or more of a variety of surfaces. These coatings and methods exhibit minimal toxicity to humans, non-human animals, including pets, and the environment more generally. The presently-disclosed coatings, which do not contain a halogen component, may be suitably employed, for example, on monuments, textiles, metals, stone, ceramic, wood, or other surface.

Provided are halogen-free coatings, and methods for making and using such halogen-free coatings, for water and oil protection or repellants, which coatings control and/or eliminate the effect of humidity and oily substances on one or more of a variety of surfaces. These coatings and methods exhibit minimal toxicity to humans, non-human animals, including pets, and the environment more generally. The presently-disclosed coatings, which do not contain a halogen component, may be suitably employed, for example, on monuments, textiles, metals, stone, ceramic, wood, or other surface.

The present invention discloses an antibacterial ceramic tile and a preparation method thereof. The method comprises applying an antibacterial protective glaze containing Ulan tea-quartz on the surface of a green body, and then firing to obtain an antibacterial ceramic tile. The mass percentage of Ulan tea-quartz to the antibacterial protective glaze is 35% to 45%. Controlling the mass percentage content of Ulan tea-quartz to the antibacterial protective glaze within the aforementioned range not only can achieve an excellent antibacterial property, but also avoids excessive glossiness, rough texture, or poor flatness of the ceramic glaze surface.

A method of making a ceramic glaze formulation having an antimicrobial property for use with a ceramic article. The method comprises fritting an antimicrobial formulation in a flux frit, providing least one unfritted antimicrobial component, providing a silver carrier in a glass matrix, and combining the flux frit, the at least one unfritted component, and the silver carrier in the glass matrix to form the ceramic glaze formulation. The silver carrier is combined at an addition rate based on a dry weight basis of the ceramic glaze formulation. A ceramic glaze additive formulation and ceramic glazed article are also provided.

A method of making a ceramic glaze formulation having an antimicrobial property for use with a ceramic article. The method comprises fritting an antimicrobial formulation in a flux frit, providing least one unfritted antimicrobial component, providing a silver carrier in a glass matrix, and combining the flux frit, the at least one unfritted component, and the silver carrier in the glass matrix to form the ceramic glaze formulation. The silver carrier is combined at an addition rate based on a dry weight basis of the ceramic glaze formulation. A ceramic glaze additive formulation and ceramic glazed article are also provided.

A process for conducting vapor phase deposition is disclosed. The process separates a series of reactions through a sequence of reaction reservoirs. The reactor includes a reactive precursor reservoir beneath a powder reservoir separated by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.

A process for conducting vapor phase deposition is disclosed. The process separates a series of reactions through a sequence of reaction reservoirs. The reactor includes a reactive precursor reservoir beneath a powder reservoir separated by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.

A biocidal additive package comprises at least one metal or metal containing compound selected from the group consisting of Cu.sub.2O, Cu(OH).sub.2, Cu, CuO.sub.3, Cu.sub.2O.sub.3, and a combination thereof, and at least one non-copper metal or non-copper containing metal compound. Non-limiting examples of non-copper metal and non-copper containing metal compounds are Ag, Ag.sub.2O, Bi, Bi.sub.2O.sub.3, Zn, ZnO, or a combination thereof. A biocidal ceramic glaze layer and an article comprising a biocidal ceramic glaze layer are provided. Also provided is a method of affixing a biocidal ceramic glaze to a substrate.

A biocidal additive package comprises at least one metal or metal containing compound selected from the group consisting of Cu.sub.2O, Cu(OH).sub.2, Cu, CuO.sub.3, Cu.sub.2O.sub.3, and a combination thereof, and at least one non-copper metal or non-copper containing metal compound. Non-limiting examples of non-copper metal and non-copper containing metal compounds are Ag, Ag.sub.2O, Bi, Bi.sub.2O.sub.3, Zn, ZnO, or a combination thereof. A biocidal ceramic glaze layer and an article comprising a biocidal ceramic glaze layer are provided. Also provided is a method of affixing a biocidal ceramic glaze to a substrate.

A process for conducting vapor phase deposition is disclosed. The process separates a series of reactions through a sequence of reaction reservoirs. The reactor includes a reactive precursor reservoir beneath a powder reservoir separated by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.