The invention provides a compound of chemical formula (1), a precursor compound for producing the compound, a surfactant composition and a detergent composition including the compound,

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wherein R.sup.1 and R.sup.2 are each an aliphatic hydrocarbon group, X is a single bond or a hydrocarbon group having 1 or more and 5 or less carbon atoms, a total number of carbon atoms of R.sup.1, R.sup.2, and X is 2 or more and 39 or less, A.sup.1 is O(-A.sup.11O).sub.l-H, A.sup.2 is OCH.sub.2CH(O(-A.sup.21O).sub.m-H)(CH.sub.2O(-A.sup.22O).sub.n-H) or OCH(CH.sub.2O(-A.sup.23O).sub.s-H)(CH.sub.2O(-A.sup.24O).sub.t-H), A.sup.11, A.sup.21, A.sup.22, A.sup.23, and A.sup.24 are each independently an alkanediyl group having 2 or more and 8 or less carbon atoms, l, m, n, s, and t are an average value and are each independently 0 or more, and a total of l, m, and n, and a total of l, s, and t are each independently more than 0 and 200 or less.

A system and a method for producing ethylene glycol are disclosed. Alkylene oxide and water are flowed into a first reactor unit and subjecting the alkylene oxide and water, in the first reactor unit, to first reaction conditions such that an effluent of the first reactor unit comprises an alkylene glycol, unreacted alkylene oxide, and unreacted water. At least a portion of the unreacted alkylene oxide may be routed to a second reaction unit and subjected to reaction conditions sufficient to produce additional alkylene glycol, wherein the second reactor unit is a reactive distillation column.

A system and a method for producing ethylene glycol are disclosed. Alkylene oxide and water are flowed into a first reactor unit and subjecting the alkylene oxide and water, in the first reactor unit, to first reaction conditions such that an effluent of the first reactor unit comprises an alkylene glycol, unreacted alkylene oxide, and unreacted water. At least a portion of the unreacted alkylene oxide may be routed to a second reaction unit and subjected to reaction conditions sufficient to produce additional alkylene glycol, wherein the second reactor unit is a reactive distillation column.

A fluorine-containing ether compound represented by Formula (1) is provided,

R.sup.1-R.sup.2CH.sub.2R.sup.3CH.sub.2R.sup.4(1)

(In Formula (1), R.sup.1 is an alkyl group that may have a substituent, R.sup.2 is a divalent linking group bonded to R.sup.1 via an ethereal oxygen, R.sup.3 is a perfluoropolyether chain, and R.sup.4 is an end group which is different from R.sup.1-R.sup.2 and includes two or three polar groups, in which each of the polar groups is bonded to a different carbon atom, and the carbon atoms bonded to the polar groups are bonded to each other via a linking group containing a carbon atom not bonded to the polar groups.).

A method for producing a polyurethane polymer comprises the steps of: (a) providing a polyol composition, the polyol composition comprising (i) a polyol, (ii) a polyethylenimine compound; and (iii) a bisulfite compound, (b) providing an isocyanate compound; (c) providing a catalyst; (d) combining and reacting the polyol composition, the isocyanate compound, and the catalyst to produce a polyurethane polymer.

A method for producing a polyurethane polymer comprises the steps of: (a) providing a polyol composition, the polyol composition comprising (i) a polyol, (ii) a polyethylenimine compound; and (iii) a bisulfite compound, (b) providing an isocyanate compound; (c) providing a catalyst; (d) combining and reacting the polyol composition, the isocyanate compound, and the catalyst to produce a polyurethane polymer.

A Perovskite solution is described for use in making a uniform Perovskite layer at high speed to enable low cost production of high efficiency Perovskite devices. The Perovskite solution contains a solvent, an organic Perovskite precursor material, and an inorganic Perovskite precursor material, wherein the amount of solvent is greater than 30 percent by weight and the Perovskite solution has a total solids concentration that is between 30 percent and 70 percent by weight of the Perovskite solution's saturation concentration at a solution temperature of from 20 to 25 degrees Celsius.

A Perovskite solution is described for use in making a uniform Perovskite layer at high speed to enable low cost production of high efficiency Perovskite devices. The Perovskite solution contains a solvent, an organic Perovskite precursor material, and an inorganic Perovskite precursor material, wherein the amount of solvent is greater than 30 percent by weight and the Perovskite solution has a total solids concentration that is between 30 percent and 70 percent by weight of the Perovskite solution's saturation concentration at a solution temperature of from 20 to 25 degrees Celsius.

A (meth)acrylic monomer is represented by general formula (1) (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 to R.sup.4 independently represent CH.sub.3 or CH.sub.2OR.sup.5, wherein at least one of R.sup.2 to R.sup.4 represents CH.sub.2OR.sup.5; R.sup.5 represents an alkyl group having 1 to 4 carbon atoms; and Z represents multiple atoms necessary for the formation of an alicyclic hydrocarbon group having 3 to 10 carbon atoms in conjunction with a carbon atom). The (meth)acrylic monomer has a property of high acid degradability and can be removed by the action of an acid.

A (meth)acrylic monomer is represented by general formula (1) (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 to R.sup.4 independently represent CH.sub.3 or CH.sub.2OR.sup.5, wherein at least one of R.sup.2 to R.sup.4 represents CH.sub.2OR.sup.5; R.sup.5 represents an alkyl group having 1 to 4 carbon atoms; and Z represents multiple atoms necessary for the formation of an alicyclic hydrocarbon group having 3 to 10 carbon atoms in conjunction with a carbon atom). The (meth)acrylic monomer has a property of high acid degradability and can be removed by the action of an acid.