The invention relates to a compound of following formula (I):

##STR00001##

a preparation process, uses thereof and compositions containing the same, wherein R.sub.1 and R.sub.2, represent, independently of one another, a linear, branched or cyclic, saturated or unsaturated hydrocarbon-based group comprising from 1 to 6 carbon atoms, where the sum of the carbon atoms of the groups R.sub.1 and R.sub.2 ranges from 2 to 7, and where R.sub.1 and R.sub.2 may also form, together and with the carbon atom bearing them, a 6-, 7-, or 8-membered ring; n is an integer of between 1 and 100, limits included; A represents a sequence of one or more units chosen from ethylene oxide, propylene oxide, butylene oxide units and mixtures thereof; the group formed by R.sub.1, R.sub.2 and the carbon atom to which R.sub.1 and R.sub.2 are attached has a degree of branching equal to 0, 1 or 2.

The invention relates to a compound of following formula (I):

##STR00001##

a preparation process, uses thereof and compositions containing the same, wherein R.sub.1 and R.sub.2, represent, independently of one another, a linear, branched or cyclic, saturated or unsaturated hydrocarbon-based group comprising from 1 to 6 carbon atoms, where the sum of the carbon atoms of the groups R.sub.1 and R.sub.2 ranges from 2 to 7, and where R.sub.1 and R.sub.2 may also form, together and with the carbon atom bearing them, a 6-, 7-, or 8-membered ring; n is an integer of between 1 and 100, limits included; A represents a sequence of one or more units chosen from ethylene oxide, propylene oxide, butylene oxide units and mixtures thereof; the group formed by R.sub.1, R.sub.2 and the carbon atom to which R.sub.1 and R.sub.2 are attached has a degree of branching equal to 0, 1 or 2.

A fluorine-containing ether compound of the present invention is represented by Formula (1).
R.sup.1CH.sub.2R.sup.2CH.sub.2R.sup.3(1) (In Formula (1), R.sup.1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R.sup.2 includes a perfluoropolyether chain represented by Formula (3), and R.sup.3 is a hydroxyl group or R.sup.1)
(CF.sub.2).sub.y1O((CF.sub.2).sub.yO).sub.z(CF.sub.2).sub.y1(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).

A composition comprises a polyol and a polyethylenimine compound. A method for reducing the volatile aldehyde content of a polyol comprises the steps of: (a) providing a polyol, the polyol containing a first amount of volatile aldehyde compounds; (b) providing a polyethylenimine compound; and (c) adding the polyethylenimine compound to the polyol to produce a composition.

A composition comprises a polyol and a polyethylenimine compound. A method for reducing the volatile aldehyde content of a polyol comprises the steps of: (a) providing a polyol, the polyol containing a first amount of volatile aldehyde compounds; (b) providing a polyethylenimine compound; and (c) adding the polyethylenimine compound to the polyol to produce a composition.

A method of producing one or more glycerol ethers, the method comprising contacting glycerol and tertiary butanol (TBA) in the presence of an acidic catalyst to produce one or more glycerol ethers selected from mono-tert butyl glycerol ethers, di-tert butyl glycerol ethers, tri-tert butyl glycerol ethers, or a combination thereof; separating water and a stream comprising isobutylene, unreacted TBA, or a combination thereof from the one or more glycerol ethers; and recycling at least a portion of the stream comprising isobutylene, unreacted TBA, or a combination thereof to the contacting. Also disclosed is a process of co-producing isooctene, wherein the process involves contacting glycerol and tertiary butanol in the presence of a dehydrating catalyst and dimerizing/oligomerizing the dehydrated products in the presence of an oligomerizing catalyst to form isooctene, a precursor of isooctane and isomers thereof.

A method of producing one or more glycerol ethers, the method comprising contacting glycerol and tertiary butanol (TBA) in the presence of an acidic catalyst to produce one or more glycerol ethers selected from mono-tert butyl glycerol ethers, di-tert butyl glycerol ethers, tri-tert butyl glycerol ethers, or a combination thereof; separating water and a stream comprising isobutylene, unreacted TBA, or a combination thereof from the one or more glycerol ethers; and recycling at least a portion of the stream comprising isobutylene, unreacted TBA, or a combination thereof to the contacting. Also disclosed is a process of co-producing isooctene, wherein the process involves contacting glycerol and tertiary butanol in the presence of a dehydrating catalyst and dimerizing/oligomerizing the dehydrated products in the presence of an oligomerizing catalyst to form isooctene, a precursor of isooctane and isomers thereof.

A fluorine-containing ether compound represented by a formula (1) shown below.

R.sup.4CH.sub.2R.sup.3CH.sub.2R.sup.2CH.sub.2R.sup.1CH.sub.2R.sup.2CH.sub.2R.sup.3CH.sub.2R.sup.5(1)

In formula (1), R.sup.1 and R.sup.3 represent the same or different perfluoropolyether chains, R.sup.2 represents a linking group containing at least one polar group, one or both of R.sup.4 and R.sup.5 represent a terminal group containing two or more polar groups, and R.sup.4 and R.sup.5 are different.

The present invention relates to a polyethylene glycol derivative and a preparation method thereof. A preparation process of a polyethylene glycol derivative, according to the present invention, may provide a novel polyethylene glycol derivative which can be utilized in various ways as a drug linker, and is appropriate and effective for mass production and is advantageous in reproducible mass production of high-quality products.

A novel resist underlayer film forming composition containing a compound has a hydantoin ring. A resist underlayer film forming composition has a compound having at least two substituents of the following formula (1):

##STR00001##

(wherein R.sub.1 and R.sub.2 are each independently a hydrogen atom or a methyl group, and X.sub.1 is a C.sub.1-3 hydroxyalkyl group or a C.sub.2-6 alkyl group having one or two ether bonds in a main chain) in the molecule, and a solvent.