C07C233/54

Alkylamido Compounds and Uses Thereof
20190269637 · 2019-09-05 ·

Disclosed herein are compounds that may be specific to PPAR and/or EGF receptors, and methods of making and using same.

Methods of treating hair related conditions

Disclosed herein are methods for treating hair related disorders, including compounds that may be specific or modulate PPAR receptors.

Methods of treating hair related conditions

Disclosed herein are methods for treating hair related disorders, including compounds that may be specific or modulate PPAR receptors.

BETA-SUBSTITUTED BETA-AMINO ACIDS AND ANALOGS AS CHEMOTHERAPEUTIC AGENTS AND USES THEREOF

-Substituted -amino acids, -substituted -amino acid derivatives, and -substituted -amino acid analogs and (bio)isosteres and their use as chemotherapeutic agents are disclosed. The -substituted -amino acid derivatives and -substituted -amino acid analogs and (bio)isosteres are selective LAT1/4F2hc substrates and exhibit rapid uptake and retention in tumors expressing the LAT1/4F2hc transporter. Methods of synthesizing the -substituted -amino acid derivatives and -substituted -amino acid analogs and methods of using the compounds for treating cancer are also disclosed. The -substituted -amino acid derivatives and -substituted -amino acid analogs exhibit selective uptake in tumor cells expressing the LAT1/4F2hc transporter and accumulate in cancerous cells when administered to a subject in vivo. The -substituted -amino acid derivatives and -substituted -amino acid analogs and (bio)isosteres exhibit cytotoxicity toward several tumor types.

BETA-SUBSTITUTED BETA-AMINO ACIDS AND ANALOGS AS CHEMOTHERAPEUTIC AGENTS AND USES THEREOF

-Substituted -amino acids, -substituted -amino acid derivatives, and -substituted -amino acid analogs and (bio)isosteres and their use as chemotherapeutic agents are disclosed. The -substituted -amino acid derivatives and -substituted -amino acid analogs and (bio)isosteres are selective LAT1/4F2hc substrates and exhibit rapid uptake and retention in tumors expressing the LAT1/4F2hc transporter. Methods of synthesizing the -substituted -amino acid derivatives and -substituted -amino acid analogs and methods of using the compounds for treating cancer are also disclosed. The -substituted -amino acid derivatives and -substituted -amino acid analogs exhibit selective uptake in tumor cells expressing the LAT1/4F2hc transporter and accumulate in cancerous cells when administered to a subject in vivo. The -substituted -amino acid derivatives and -substituted -amino acid analogs and (bio)isosteres exhibit cytotoxicity toward several tumor types.

Onium Salt, Resist Composition, And Patterning Process
20240184199 · 2024-06-06 · ·

The present invention is an onium salt represented by the following general formula (1), where n1 represents an integer of 0 or 1; n2 represents an integer of 0 to 3; R.sup.1a represents a hydrocarbyl group having 1 to 20 carbon atoms and optionally containing a heteroatom; n3 represents an integer of 0 to 3; R.sup.1b represents a hydrocarbyl group having 1 to 36 carbon atoms and optionally containing a heteroatom; X.sup.A represents a carbonyl group that forms an amide bond together with an adjacent NH or represents a sulfonyl group that forms a sulfonamide bond together with the adjacent NH; n4 represents an integer of 1 or 2; and Z.sup.+ represents an onium cation. This provides: a resist composition in lithography that has high sensitivity and excellent resolution, can improve LWR and CDU, and can also suppress collapse of a resist pattern; and a novel onium salt to be used in the resist composition.

##STR00001##

Onium Salt, Resist Composition, And Patterning Process
20240184199 · 2024-06-06 · ·

The present invention is an onium salt represented by the following general formula (1), where n1 represents an integer of 0 or 1; n2 represents an integer of 0 to 3; R.sup.1a represents a hydrocarbyl group having 1 to 20 carbon atoms and optionally containing a heteroatom; n3 represents an integer of 0 to 3; R.sup.1b represents a hydrocarbyl group having 1 to 36 carbon atoms and optionally containing a heteroatom; X.sup.A represents a carbonyl group that forms an amide bond together with an adjacent NH or represents a sulfonyl group that forms a sulfonamide bond together with the adjacent NH; n4 represents an integer of 1 or 2; and Z.sup.+ represents an onium cation. This provides: a resist composition in lithography that has high sensitivity and excellent resolution, can improve LWR and CDU, and can also suppress collapse of a resist pattern; and a novel onium salt to be used in the resist composition.

##STR00001##

RESIST COMPOSITION AND PATTERNING PROCESS
20190155155 · 2019-05-23 · ·

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

RESIST COMPOSITION AND PATTERNING PROCESS
20190155155 · 2019-05-23 · ·

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.