Patent classifications
C07C271/12
Fused cyclooctyne compounds and their use in metal-free click reactions
The invention relates to fused cyclooctyne compounds, and to a method for their preparation. The invention also relates to a conjugate wherein a fused cyclooctyne compound according to the invention is conjugated to a label, and to the use of these conjugates in bioorthogonal labeling, imaging and/or modification, such as for example surface modification, of a target molecule. The invention further relates to a method for the modification of a target molecule, wherein a conjugate according to the invention is reacted with a compound comprising a 1,3-dipole or a 1,3-(hetero)diene.
Fused cyclooctyne compounds and their use in metal-free click reactions
The invention relates to fused cyclooctyne compounds, and to a method for their preparation. The invention also relates to a conjugate wherein a fused cyclooctyne compound according to the invention is conjugated to a label, and to the use of these conjugates in bioorthogonal labeling, imaging and/or modification, such as for example surface modification, of a target molecule. The invention further relates to a method for the modification of a target molecule, wherein a conjugate according to the invention is reacted with a compound comprising a 1,3-dipole or a 1,3-(hetero)diene.
PROCESS FOR THE PREPARATION OF SOLRIAMFETOL AND SALT THEREOF
The present invention relates to solriamfetol or novel salts thereof and its process for preparation. More particularly the present invention relates to solriamfetol dibenzoyl-D-tartaric acid salt or solriamfetol di-p-toluoyl-D-tartaric acid salt and their process for preparation. Further the present invention relates to use of solriamfetol dibenzoyl-D-tartaric acid salt or solriamfetol di-p-toluoyl-D-tartaric acid salt for the preparation of solriamfetol hydrochloride.
PROCESS FOR THE PREPARATION OF SOLRIAMFETOL AND SALT THEREOF
The present invention relates to solriamfetol or novel salts thereof and its process for preparation. More particularly the present invention relates to solriamfetol dibenzoyl-D-tartaric acid salt or solriamfetol di-p-toluoyl-D-tartaric acid salt and their process for preparation. Further the present invention relates to use of solriamfetol dibenzoyl-D-tartaric acid salt or solriamfetol di-p-toluoyl-D-tartaric acid salt for the preparation of solriamfetol hydrochloride.
AMINO ACIDS
In some embodiments, the present disclosure provides amino acid compounds that are useful for producing products such as peptides. In some embodiments, the present disclosure provides peptides comprising residues of provided amino acids.
Cleavable additives for use in a method of making a semiconductor substrate
The use of an organic compound as cleavable additive, preferably as cleavable surfactant, in the modification and/or treatment of at least one surface of a semiconductor substrate is described. Moreover, it is described a method of making a semiconductor substrate, comprising contacting at least one surface thereof with an organic compound, or with a composition comprising it, to treat or modify said surface, cleaving said organic compound into a set of fragments and removing said set of fragments from the contacted surface. More in particular, a method of cleaning or rinsing a semiconductor substrate or an intermediate semiconductor substrate is described. In addition, a compound is described which is suitable for the uses and methods pointed out above and which preferably is a cleavable surfactant.
Cleavable additives for use in a method of making a semiconductor substrate
The use of an organic compound as cleavable additive, preferably as cleavable surfactant, in the modification and/or treatment of at least one surface of a semiconductor substrate is described. Moreover, it is described a method of making a semiconductor substrate, comprising contacting at least one surface thereof with an organic compound, or with a composition comprising it, to treat or modify said surface, cleaving said organic compound into a set of fragments and removing said set of fragments from the contacted surface. More in particular, a method of cleaning or rinsing a semiconductor substrate or an intermediate semiconductor substrate is described. In addition, a compound is described which is suitable for the uses and methods pointed out above and which preferably is a cleavable surfactant.
A PROCESS FOR THE PURIFICATION OF (R)-2-AMINO-3-PHENYLPROPYL CARBAMATE
The present invention relates to a process for the purification of (R)-2-amino-3-phenylpropyl carbamate in perspective of the subsequent conversion in the corresponding HCl salt (SOLRIAMFETOL). The invention further relates to the process for preparing a batch of purified solriamfetol, as well as to the purified (R)-2-amino-3-phenylpropyl carbamate or its hydrochloride salt.
A PROCESS FOR THE PURIFICATION OF (R)-2-AMINO-3-PHENYLPROPYL CARBAMATE
The present invention relates to a process for the purification of (R)-2-amino-3-phenylpropyl carbamate in perspective of the subsequent conversion in the corresponding HCl salt (SOLRIAMFETOL). The invention further relates to the process for preparing a batch of purified solriamfetol, as well as to the purified (R)-2-amino-3-phenylpropyl carbamate or its hydrochloride salt.
A PROCESS FOR THE PURIFICATION OF (R)-2-AMINO-3-PHENYLPROPYL CARBAMATE
The present invention relates to a process for the purification of (R)-2-amino-3-phenylpropyl carbamate in perspective of the subsequent conversion in the corresponding HCl salt (SOLRIAMFETOL). The invention further relates to the process for preparing a batch of purified solriamfetol, as well as to the purified (R)-2-amino-3-phenylpropyl carbamate or its hydrochloride salt.