A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

A non-aqueous electrolyte solution for a battery contains a phosphazene compound (A) that contains at least one of a phosphazene compound represented by Formula (1) or a phosphazene compound represented by Formula (2). In Formulae (1) and (2), each of Y.sup.− and Z.sup.− independently represents an anion in which a proton is removed from an inorganic acid or an active hydrogen compound; each of twenty-four Rs independently represents a hydrocarbon group having from 1 to 10 carbon atoms; and, among the twenty-four Rs, two Rs bonded to the same nitrogen atom are optionally bonded to each other.

##STR00001##

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: ##STR00001## wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: ##STR00001## wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va.sup.1 is a divalent hydrocarbon group. n.sub.a1 represents an integer of 0 to 2. Ra′.sup.12 and Ra′.sup.13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′.sup.14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R.sup.b1 represents a cyclic hydrocarbon group. Y.sup.b1 represents a divalent linking group containing an ester bond. V.sup.b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M.sup.m+ is an m-valent organic cation.

##STR00001##

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va.sup.1 is a divalent hydrocarbon group. n.sub.a1 represents an integer of 0 to 2. Ra′.sup.12 and Ra′.sup.13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′.sup.14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R.sup.b1 represents a cyclic hydrocarbon group. Y.sup.b1 represents a divalent linking group containing an ester bond. V.sup.b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M.sup.m+ is an m-valent organic cation.

##STR00001##

The present invention is to provide a hydrogen oxidation catalyst that does not contain platinum. Disclosed is a hydrogen oxidation catalyst that is a dinuclear transition metal complex having a chemical structure represented by the following general formula (1) or (2): ##STR00001##
wherein, in the general formulae (1) and (2), M.sup.1 and M.sup.2 are each independently Fe or Ru; Ar.sup.1 and Ar.sup.2 are each independently a cyclopentadienyl group or a pentamethylcyclopentadienyl group; Ar.sup.3 and Ar.sup.4 are each independently a divalent aromatic hydrocarbon group having 6 to 12 carbon atoms; and Ar.sup.5 is a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms, and in the general formula (2), R.sup.1 and R.sup.2 are each independently a hydrogen atom or a monovalent aliphatic hydrocarbon group having 1 to 3 carbon atoms.

The present invention is to provide a hydrogen oxidation catalyst that does not contain platinum. Disclosed is a hydrogen oxidation catalyst that is a dinuclear transition metal complex having a chemical structure represented by the following general formula (1) or (2): ##STR00001##
wherein, in the general formulae (1) and (2), M.sup.1 and M.sup.2 are each independently Fe or Ru; Ar.sup.1 and Ar.sup.2 are each independently a cyclopentadienyl group or a pentamethylcyclopentadienyl group; Ar.sup.3 and Ar.sup.4 are each independently a divalent aromatic hydrocarbon group having 6 to 12 carbon atoms; and Ar.sup.5 is a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms, and in the general formula (2), R.sup.1 and R.sup.2 are each independently a hydrogen atom or a monovalent aliphatic hydrocarbon group having 1 to 3 carbon atoms.

The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I): ##STR00001##
wherein, in formula (I), R.sup.1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, X.sup.1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and * represents a bonding site to R.sup.1, L.sup.1 represents a single bond or a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO.sub.2—, R.sup.2 represents a saturated hydrocarbon group having 1 to 12 carbon atoms, u1 represents an integer of 0 to 2, s1 represents 1 or 2, t1 represents 0 or 1, in which s1+t1 is 1 or 2, n represents an integer of 2 or more, and a plurality of X.sup.1, L.sup.1, s1, t1, R.sup.2 and u1 each may be the same or different from each other.

To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0):

##STR00001##

wherein Ar is a group having an aryl group having 6 to 60 carbon atoms, each OR.sup.TS is independently a hydroxy group or a group having a specified ion moiety, and n.sup.1 is an integer of 1 to 20, provided that at least one OR.sup.TS is a group having a specified ion moiety.