C07C309/07

Salt, resin, resist composition and method for producing resist pattern

A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.

Polymer conductor for lithium-ion batteries
09790323 · 2017-10-17 · ·

We report a new class of single-ion electrolyte including pendant lithium perfluoroethyl sulfonates. Embodiments may be based on, for example, aromatic poly(arylene ether)s, polyphenylenes, or polyarylene sulfides. The microporous polymer film saturated with organic carbonates exhibits a nearly unity t.sub.Li+, state-of-the-art conductivities (e.g. >10.sup.−3 S cm.sup.−1 at room temperature) over a wide range of temperatures, high electrochemical stability, and outstanding mechanical properties, which enables the membrane to function as both ion conducting medium and separator in the batteries.

Polymer conductor for lithium-ion batteries
09790323 · 2017-10-17 · ·

We report a new class of single-ion electrolyte including pendant lithium perfluoroethyl sulfonates. Embodiments may be based on, for example, aromatic poly(arylene ether)s, polyphenylenes, or polyarylene sulfides. The microporous polymer film saturated with organic carbonates exhibits a nearly unity t.sub.Li+, state-of-the-art conductivities (e.g. >10.sup.−3 S cm.sup.−1 at room temperature) over a wide range of temperatures, high electrochemical stability, and outstanding mechanical properties, which enables the membrane to function as both ion conducting medium and separator in the batteries.

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION
20170248844 · 2017-08-31 ·

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

NANOPARTICLE, CONTRAST AGENT FOR MAGNETIC RESONANCE IMAGING COMPRISING SAME AND ZWITTERIONIC LIGAND COMPOUND

Provided is a novel nanoparticle, a contrast agent for magnetic resonance imaging containing the same, and a zwitterionic ligand compound used in production of the nanoparticle. The contrast agent for MRI of the present invention can be suitably used as a contrast agent for MRI in a medical field. The nanoparticle and the zwitterionic ligand compound of the present invention are applicable to various pharmaceutical compositions and the like, including a contrast agent for MRI, and can be used widely in the fields of pharmaceuticals, biotechnology, and the like, including various diagnosis methods and examination reagents.

Resist composition, patterning process, and barium salt

A resist composition comprising a base resin comprising recurring units having an acid labile group, and a metal salt of sulfonic acid exhibits a high sensitivity and high resolution, and forms a pattern of satisfactory profile with minimal LWR or improved CDU when processed by lithography.

Resist composition, patterning process, and barium salt

A resist composition comprising a base resin comprising recurring units having an acid labile group, and a metal salt of sulfonic acid exhibits a high sensitivity and high resolution, and forms a pattern of satisfactory profile with minimal LWR or improved CDU when processed by lithography.

Sulfonic acid, carboxylic acid, and salts thereof

A sulfonic acid or carboxylic acid containing a carbonyl group, or a salt thereof represented by the following formula:
R.sup.1—C(═O)—(CR.sup.2.sub.2).sub.n—(OR.sup.3).sub.p—(CR.sup.4.sub.2).sub.q-L-A
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, n, p, q, A and L are as defined herein.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of 1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than 1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.

##STR00001##

FORMULATIONS FOR ENHANCED OIL RECOVERY COMPRISING SULFONATES

Compositions suitable for enhanced oil recovery comprising a) a mixture of -sulfocarbonyl compounds of formulae (1) and (2) in a mixture ratio (1) to (2) of from 1:99 to 99:1

##STR00001## wherein R.sub.1, R.sub.3 and R.sub.5, which may be the same or different at each occurrence, are hydrogen or a linear or branched alkyl chain having 1 to 20 carbon atoms, R.sub.2 and R.sub.4, which may be the same or different at each occurrence, may be a linear or branched alkyl group having 4 to 24 carbon atoms and in which the alkyl chain may comprise one or more cycloaliphatic groups, and X is H or a metal forming a salt with the sulfonate group, and b) a salt containing aqueous solution.