Patent classifications
C07C309/13
METHODS OF MAKING AND USING LIGNIN DERIVATIVES
Materials and methods for preparing reactive lignin and for preparing a bio-based adhesive are described herein.
HYDROPHILIC OIL REPELLENT AND PRODUCTION METHOD OF SAME, SURFACE COATING MATERIAL, COATING FILM, RESIN COMPOSITION, OIL-WATER SEPARATION FILTER MATERIAL, AND POROUS BODY
The hydrophilic oil repellent includes one or more types of nitrogen-containing fluorine-based compounds. The nitrogen-containing fluorine-based compound includes any one hydrophilicity imparting group selected from the group consisting of anion type hydrophilicity imparting groups, cation type hydrophilicity imparting groups, and amphoteric type hydrophilicity imparting groups in the molecule.
HYDROPHILIC OIL REPELLENT AND PRODUCTION METHOD OF SAME, SURFACE COATING MATERIAL, COATING FILM, RESIN COMPOSITION, OIL-WATER SEPARATION FILTER MATERIAL, AND POROUS BODY
The hydrophilic oil repellent includes one or more types of nitrogen-containing fluorine-based compounds. The nitrogen-containing fluorine-based compound includes any one hydrophilicity imparting group selected from the group consisting of anion type hydrophilicity imparting groups, cation type hydrophilicity imparting groups, and amphoteric type hydrophilicity imparting groups in the molecule.
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO.sub.3.sup., wherein a hydrogen atom or an electron-donating group bonds to an carbon atom with respect to SO.sub.3.sup., and an electron-withdrawing group bonds to a carbon atom with respect to SO.sub.3.sup.; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a monovalent electron-donating group. R.sup.3 represent a monovalent electron-withdrawing group. R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group.
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RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO.sub.3.sup., wherein a hydrogen atom or an electron-donating group bonds to an carbon atom with respect to SO.sub.3.sup., and an electron-withdrawing group bonds to a carbon atom with respect to SO.sub.3.sup.; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a monovalent electron-donating group. R.sup.3 represent a monovalent electron-withdrawing group. R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group.
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