A salt represented by formula (I): ##STR00001## In formula (I), R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R.sup.5, R.sup.6 and R.sup.7 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH.sub.2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 0 to 3, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, R.sup.8 and R.sup.9 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and —CH.sub.2— included in the alkyl group may be replaced by —O— or —CO—, and Al.sup.− represents an organic anion.

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is —NR′—, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is —NR′—, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is —NR′—, R.sup.2 and R.sup.3 are each independently a monovalent organic group. ##STR00001##

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is —NR′—, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is —NR′—, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is —NR′—, R.sup.2 and R.sup.3 are each independently a monovalent organic group. ##STR00001##

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

A process for producing a surfactant having two head groups and a single tail group per molecule, including steps of: producing a compound of Formula (1) from ethanol and carbon disulfide; producing a compound of Formula (2) from a carboxylic acid and bromine; producing a compound of Formula (3) from the compound of Formula (2) and methanol; producing a compound of Formula (4) from the compound of Formula (1) and the compound of Formula (3); and producing a compound of Formula (5) from the compound of Formula (4) by a direct oxidation process or by a peracid oxidation process. The surfactant produced by the process has lower critical micelle concentration and enables a lower surface tension of a liquid as compared with prior surfactants with two head groups per molecule, thereby enabling the amount of surfactant required and thus the cost to be substantially reduced.

A process for producing a surfactant having two head groups and a single tail group per molecule, including steps of: producing a compound of Formula (1) from ethanol and carbon disulfide; producing a compound of Formula (2) from a carboxylic acid and bromine; producing a compound of Formula (3) from the compound of Formula (2) and methanol; producing a compound of Formula (4) from the compound of Formula (1) and the compound of Formula (3); and producing a compound of Formula (5) from the compound of Formula (4) by a direct oxidation process or by a peracid oxidation process. The surfactant produced by the process has lower critical micelle concentration and enables a lower surface tension of a liquid as compared with prior surfactants with two head groups per molecule, thereby enabling the amount of surfactant required and thus the cost to be substantially reduced.

The present invention aims to provide a coating material which has high mechanical stability and is capable of providing a coat which has excellent appearance and exhibits excellent damping properties in a wide temperature range. The present invention relates to a damping-imparting agent including a compound having a sulfosuccinic acid (salt) structure. The present invention also relates to a resin composition for damping materials, including an emulsion prepared by polymerizing a monomer component, the composition further including a component having a sulfosuccinic acid (salt) structure.

The present invention aims to provide a coating material which has high mechanical stability and is capable of providing a coat which has excellent appearance and exhibits excellent damping properties in a wide temperature range. The present invention relates to a damping-imparting agent including a compound having a sulfosuccinic acid (salt) structure. The present invention also relates to a resin composition for damping materials, including an emulsion prepared by polymerizing a monomer component, the composition further including a component having a sulfosuccinic acid (salt) structure.

Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.