Substituted hydroquinones and quinones and methods of synthesizing such compounds are disclosed herein. The substituted hydroquinones have the formula: ##STR00001##
while the substituted quinones have the corresponding oxidized structure (1,4-benzoquinones). One, two, three, or all four of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 comprise a thioether moiety and a sulfonate moiety, and wherein each R.sup.1, R.sup.2, R.sup.3 and R.sup.4 that does not comprise a thioether and a sulfonate moiety sulfonate moiety is independently a hydrogen, an alkyl or an electron withdrawing group. The substituted hydroquinones and quinones are soluble in water, stable in aqueous acid solutions, and have a high reduction potential in the oxidized form. Accordingly, they can be used as redox mediators in emerging technologies, such as in mediated fuel cells or organic-mediator flow batteries.

Surfactants of general formula (I), in which R.sup.1 denotes a linear or branched alkyl residue having 6 to 20, and in particular 8 to 14 carbon atoms, R.sup.2 denotes H or CH.sub.3, and M denotes hydrogen, an alkali metal or an N.sup.+R.sup.3R.sup.4R.sup.5 grouping, in which R.sup.3, R.sup.4 and R.sup.5, independently of one another, denote hydrogen, an alkyl group having 1 to 6 carbon atoms or a hydroxyalkyl group having 2 to 6 carbon atom, can be easily incorporated into washing or cleaning agents, have outstanding application-related properties, and can be produced based on renewable resources.

Surfactants of general formula (I), in which R.sup.1 denotes a linear or branched alkyl residue having 6 to 20, and in particular 8 to 14 carbon atoms, R.sup.2 denotes H or CH.sub.3, and M denotes hydrogen, an alkali metal or an N.sup.+R.sup.3R.sup.4R.sup.5 grouping, in which R.sup.3, R.sup.4 and R.sup.5, independently of one another, denote hydrogen, an alkyl group having 1 to 6 carbon atoms or a hydroxyalkyl group having 2 to 6 carbon atom, can be easily incorporated into washing or cleaning agents, have outstanding application-related properties, and can be produced based on renewable resources.

The invention relates to a stabilizer for L-012 or a salt thereof, a stabilization method for L-012 or a salt thereof, coexisting with the stabilizer and L-012 or a salt thereof, and the like. The stabilizer is represented by Formula [1]: ##STR00001##
wherein p pieces of M1 each independently represent a hydrogen atom or an alkali metal atom, q pieces of R1 each independently represent a hydroxy group or a sulfonic acid group, m represents 0 or 1, p represents an integer of 1 to 3, q represents an integer of 0 to 4, Y represents a nitrogen atom or a CH group (a methine group), and Z represents an aryl group having a specific structure or a pyrazolyl group having a specific structure.

The invention relates to a stabilizer for L-012 or a salt thereof, a stabilization method for L-012 or a salt thereof, coexisting with the stabilizer and L-012 or a salt thereof, and the like. The stabilizer is represented by Formula [1]: ##STR00001##
wherein p pieces of M1 each independently represent a hydrogen atom or an alkali metal atom, q pieces of R1 each independently represent a hydroxy group or a sulfonic acid group, m represents 0 or 1, p represents an integer of 1 to 3, q represents an integer of 0 to 4, Y represents a nitrogen atom or a CH group (a methine group), and Z represents an aryl group having a specific structure or a pyrazolyl group having a specific structure.

Compositions comprising a sulfonated reaction product or a salt thereof may be prepared from a diphenyl ether compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group. Methods for sulfonating an alkylated diphenyl ether compound prepared from a diphenyl ether compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group may comprise contacting the alkylated diphenyl ether compound with a sulfonating reagent; forming a sulfonated reaction product; and converting the sulfonated reaction product into a sulfonate salt.

Compositions comprising a sulfonated reaction product or a salt thereof may be prepared from a diphenyl ether compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group. Methods for sulfonating an alkylated diphenyl ether compound prepared from a diphenyl ether compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group may comprise contacting the alkylated diphenyl ether compound with a sulfonating reagent; forming a sulfonated reaction product; and converting the sulfonated reaction product into a sulfonate salt.

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

Methods are provided for modulating MRGPR X4 generally, or for treating a MRGPR X4 dependent condition more specifically, by contacting the MRGPR X4 or administering to a subject in need thereof, respectively, an effective amount of a compound having the structure of Formula (I).

##STR00001##

or a pharmaceutically acceptable isomer, racemate, hydrate, solvate, isotope, or salt thereof, wherein n, x, A, Q.sub.1, Q.sub.2, Z, R, R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are as defined herein. Pharmaceutical compositions containing such compounds, as well as to compounds themselves, are also provided.