There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid- related diseases, such as Alzheimer's disease.
R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H (I)

There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid- related diseases, such as Alzheimer's disease.
R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H (I)

There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid-? related diseases, such as Alzheimer's disease.

R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H(I)

There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid-? related diseases, such as Alzheimer's disease.

R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H(I)

The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

##STR00001##

The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

##STR00001##

There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid-? related diseases, such as Alzheimer's disease.

R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H (I)

There are provided isotope-enriched compounds of Formula (I) and pharmaceutically acceptable salts or esters thereof, as well as pharmaceutical compositions thereof and methods of use thereof for prevention and treatment of amyloid-? related diseases, such as Alzheimer's disease.

R.sup.1R.sup.2XCR.sub.2CH.sub.2CH.sub.2SO.sub.3H (I)

The present disclosure relates to methods of use and treatment by inhibition of Cathepsin G by compounds described herein.

The present disclosure relates to methods of use and treatment by inhibition of Cathepsin G by compounds described herein.