Patent classifications
C
CHEMISTRY; METALLURGY
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C07
ORGANIC CHEMISTRY
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C07D
HETEROCYCLIC COMPOUNDS
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203/00
Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom
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C07D203/04
not condensed with other rings
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C07D203/06
having no double bonds between ring members or between ring members and non-ring members
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C07D203/08
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring nitrogen atom
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C07D203/14
with carbocyclic rings directly attached to the ring nitrogen atom
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C07D203/14

Onium salt compound, resist composition, and pattern forming process
09665002 · 2017-05-30 · ·

Sulfonium and iodonium salts of a carboxylate having an aromatic ring to which a nitrogen-containing alkyl or cyclic structure is attached are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.