Patent classifications
C07D221/14
NOVEL COMPOUNDS PHOTO-CROSSLINKED BY VISIBLE LIGHT AND USES THEREOF
The present invention relates to novel compounds that are photo-crosslinked by visible light and spatiotemporal proximity photo-crosslinking by visible light activation (spotlight) using the same. When a target nucleic acid or target protein is bound to the novel compounds by the property of being photo-crosslinked to the proximal protein or peptide by irradiation with visible light and it is irradiated with visible light, the novel compounds according to the present invention can be photo-crosslinked with a protein or peptide that physically interacts with the target protein or target nucleic acid, and thus, there are advantages in that it is possible to overcome diffusive labeling, which is a limitation of the conventional proximity labeling technology, by photo-crosslinking by visible light irradiation, which is a safe method for a living body, and to improve the accuracy of protein interactome identification.
ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
An organic light-emitting display apparatus includes a substrate, an organic light-emitting device disposed above the substrate, and an encapsulation unit disposed above the organic light-emitting device and sealing the organic light-emitting device, wherein the encapsulation unit includes a compound represented by Formula 1.
[R.sub.1-(L.sub.1).sub.a1].sub.b1-(Ar.sub.1).sub.c1-[(L.sub.2).sub.a2-R.sub.2].sub.b2.Formula 1
ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
An organic light-emitting display apparatus includes a substrate, an organic light-emitting device disposed above the substrate, and an encapsulation unit disposed above the organic light-emitting device and sealing the organic light-emitting device, wherein the encapsulation unit includes a compound represented by Formula 1.
[R.sub.1-(L.sub.1).sub.a1].sub.b1-(Ar.sub.1).sub.c1-[(L.sub.2).sub.a2-R.sub.2].sub.b2.Formula 1
Compositions and methods of using the compositions for plaque softening
Disclosed herein is a compound for use in a composition applied to a blood vessel, wherein the compound softens and/or disrupts the crystalline matrix of calcified plaque. Methods of treatment comprising applying the disclosed composition are also disclosed. Plaque-softening compounds are also disclosed.
Compositions and methods of using the compositions for plaque softening
Disclosed herein is a compound for use in a composition applied to a blood vessel, wherein the compound softens and/or disrupts the crystalline matrix of calcified plaque. Methods of treatment comprising applying the disclosed composition are also disclosed. Plaque-softening compounds are also disclosed.
NAPHTHALIMIDE DYES AND USES IN NUCLEIC ACID SEQUENCING
The present application relates to dyes containing a naphthalimide core and their uses as fluorescent labels. These dyes may be used as fluorescent labels for nucleotides in nucleic acid sequencing applications.
NAPHTHALIMIDE DYES AND USES IN NUCLEIC ACID SEQUENCING
The present application relates to dyes containing a naphthalimide core and their uses as fluorescent labels. These dyes may be used as fluorescent labels for nucleotides in nucleic acid sequencing applications.
LPA2 RECEPTOR-SPECIFIC BENZOIC ACID DERIVATIVES
Disclosed is a five-feature pharmacophore model of LPA.sub.2 receptor specific agonists. Compounds may be identified as agonists of the LPA.sub.2 receptor using the five-feature pharmacophore model.
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
A chemically amplified resist composition is provided which is excellent in LWR and resolution and can prevent a resist pattern from collapsing in far ultraviolet lithography and EUV lithography, an onium salt for use therein, and a pattern forming process using the resist composition. The chemically amplified resist composition includes an onium salt having the following formula (1).
##STR00001##
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
A chemically amplified resist composition is provided which is excellent in LWR and resolution and can prevent a resist pattern from collapsing in far ultraviolet lithography and EUV lithography, an onium salt for use therein, and a pattern forming process using the resist composition. The chemically amplified resist composition includes an onium salt having the following formula (1).
##STR00001##