Patent classifications
C07D333/08
PCNHCP METAL COMPLEXES AND USES THEREOF
The present invention provides PC.sub.NHCP pincer metal complexes, which are useful as catalysts in various chemical reactions such as hydrogen isotope exchange (HIE) in C(sp.sup.3)-H and/or C(sp.sup.2)-H bond of an organic compound, e.g., a pharmaceutically active compound; hydroboration of alkynes with excellent selectivity; and alkene isomerization with high stereo- and regioselectivity.
Compounds containing carbon-carbon linker as GPR120 agonists
The present invention relates to compound of Formula (I) ##STR00001##
containing carbon-carbon linker, a stereoisomer, a tautomer, a pharmaceutically acceptable salt, a pharmaceutically acceptable solvate, a prodrug, a polymorph, N-oxide, S-oxide, or a carboxylic acid isostere thereof; processes for their preparation; pharmaceutical compositions comprising said compounds; and their use for the treatment of the diseases or disorders mediated by GPR120 receptor.
Compounds containing carbon-carbon linker as GPR120 agonists
The present invention relates to compound of Formula (I) ##STR00001##
containing carbon-carbon linker, a stereoisomer, a tautomer, a pharmaceutically acceptable salt, a pharmaceutically acceptable solvate, a prodrug, a polymorph, N-oxide, S-oxide, or a carboxylic acid isostere thereof; processes for their preparation; pharmaceutical compositions comprising said compounds; and their use for the treatment of the diseases or disorders mediated by GPR120 receptor.
Salt compound, chemically amplified resist composition, and patterning process
A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
Salt compound, chemically amplified resist composition, and patterning process
A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
ARYL COMPOUNDS AND POLYMERS AND METHODS OF MAKING AND USING THE SAME
Disclosed herein are embodiments of aryl compounds and polymers thereof that are made using methods that do not require harsh conditions or expensive reagents. The methods disclosed herein utilize precursor compounds that can be polymerized to form polycyclic aromatic hydrocarbons and polymers, such as carbon-based polymers like nanostructures (e.g., graphene or graphene-like nanoribbons).
ARYL COMPOUNDS AND POLYMERS AND METHODS OF MAKING AND USING THE SAME
Disclosed herein are embodiments of aryl compounds and polymers thereof that are made using methods that do not require harsh conditions or expensive reagents. The methods disclosed herein utilize precursor compounds that can be polymerized to form polycyclic aromatic hydrocarbons and polymers, such as carbon-based polymers like nanostructures (e.g., graphene or graphene-like nanoribbons).
ORGANIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE
An organic compound represented by the following formula [1] or [2]:
##STR00001##
wherein R.sub.1 to R.sub.22 independently denote a substituent selected from a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted amino group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted silyl group, a cyano group, a trifluoromethyl group, a substituted or unsubstituted aromatic hydrocarbon group, and a substituted or unsubstituted heterocyclic group, and R.sub.5 and R.sub.6, and/or R.sub.7 and R.sub.8 may be bonded together to form a ring structure.
ORGANIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE
An organic compound represented by the following formula [1] or [2]:
##STR00001##
wherein R.sub.1 to R.sub.22 independently denote a substituent selected from a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted amino group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted silyl group, a cyano group, a trifluoromethyl group, a substituted or unsubstituted aromatic hydrocarbon group, and a substituted or unsubstituted heterocyclic group, and R.sub.5 and R.sub.6, and/or R.sub.7 and R.sub.8 may be bonded together to form a ring structure.
Picolinamides as fungicides
This disclosure relates to picolinamides of Formula I and their use as fungicides. ##STR00001##