The invention provides a composition and method for improving the selectivity of nitride etching versus oxide etching and can be used with conventional phosphoric acid wet etch compositions. The invention describes additives that serve to inhibit silicon, oxides, and related compounds regrowth (i.e., redeposition) on the silicon oxide surface. In certain embodiments, the invention provides certain amino-substituted aryl compounds which are bound to a tri-alkoxy silane.

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture.

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture.

A branched organosilicon compound is provided which has the general formula (R.sup.1)3 Si—X—NR.sup.2—X.sup.1—NR.sup.22- In the formula: each R.sup.1 is selected from R and —OSi(R.sup.4)3, with the proviso that at least one R.sup.1 is —OSi(R.sup.4).sub.3; each R4 is selected from R, —OSi(R5)3, and —[OSiR2]mOSiR3; each R.sup.1 is selected from R, —OSi(R.sup.6).sub.3, and —[OSiR.sub.2].sub.mOSiR.sub.3; each R6 is selected from R and —[OSiR.sub.2].sub.mOSiR.sub.3; with the proviso that at least one of R.sup.4, R.sup.1 and R6 is —[OSiR.sub.2]mOSiR.sub.3; 0<m≤100. Each R is independently a substituted or unsubstituted hydrocarbyl group, e.g. a methyl group. Each of X and X.sup.1 is an independently selected divalent linking group, e.g. a divalent hydrocarbon linking group. Each R.sup.2 independently comprises a substituted or unsubstituted hydrocarbyl group, a polyether group, or H. At least one R.sup.2 comprises a polyether group. A method of preparing the branched organosilicon compound and a composition comprising the branched organosilicon compound are also provided.

A branched organosilicon compound (“compound”) having the general formula (R1).sub.3Si—X—Y is provided. In the formula: each R.sup.1 is selected from R and —OSi(R.sup.4)3, with the proviso that at least one R.sup.1 is —OSi(R.sup.4)3; each R is independently a substituted or unsubstituted hydrocarbyl group; each R.sup.4 is selected from R, —OSi(R.sup.5)3, and —[OSiR.sub.2]mOSiR.sub.3; each R.sup.5 is selected from R, —OSi(R.sup.6)3, and —[OSiR.sub.2]mOSiR.sub.3; each R.sup.6 is selected from R and —[OSiR.sub.2]mOSiR.sub.3; with the proviso that at least one of R.sup.4, R.sup.5 and R.sup.6 is —[OSiR.sub.2]mOSiR.sub.3; 0<m≤100; X is a divalent linking group; and Y is selected from one of formulas (1)-(111) described herein. Also provided is a method of preparing the compound via hydrosilylation reaction, a copolymer comprising the reaction product of the compound and a second compound reactive with the compound, a method of forming the copolymer, and a composition including at least one of the compound and the copolymer.

A method of preparing an organosilanol compound is disclosed. The method comprises reacting (A) an initial organosilicon compound and (B) water in the presence of (C) a catalyst. The catalyst (C) is selected from: (C1) [(C.sub.8H.sub.12irCl].sub.2[(p-cymene)RuCl.sub.2].sub.2; and (C3) Pd/C. The initial organosilicon compound (A) has the general formula HO—Si(R).sub.2—[Si(R).sub.2O].sub.a—OSi(R).sub.2—Y and the organosilanol compound has the general formula HO—Si(R)2-[Si(R).sub.2O].sub.a—OSi(R).sub.2—Y, where each R is an independently selected hydrocarbyl group; Y comprises a functional moiety selected from alkoxysilyl moieties, epoxide moieties, and acryloxy moieties, with the proviso that Y is other than the acryloxy moieties when the catalyst (C) is (C3) Pd/C; and subscript a is 0 or 1. The organosilanol compound prepared by the method is also provided.

A multifunctional organosilicon compound is provided which has the general formula XSi([OSiR.sub.2]p-0-SiR.sub.2Y)a(R.sup.1).sub.3-a— ln the formula, X is selected from H and ethylenically un saturated moieties; each Y independently comprises a functional moiety selected from alkoxysilyl moieties, acryloxy moieties, and epoxide moieties; each R is an independently selected hydrocarbyl group; each R1 is an independently selected hydrocarbyl group; subscript a is 1, 2, or 3; and each subscript b is independently 0, 1, or 2. A method of preparing the multifunctional organosilicon compound is also provided. The method comprises reacting (A) an organosilanol compound and (B) a silane compound having at least two hydrolysable groups. A functionalized siloxane compound prepared from the multifunctional organosilicon compound, a method of preparing the functionalized siloxane compound, and an adhesive comprising the functionalized siloxane compound are also provided.

Polyolefin compositions comprising i) a polyolefin, ii) one or more phosphorus-containing benzofuranone compounds and iii) one or more hindered phenolic antioxidants are provided excellent protection against discoloration and enhanced thermal stability during melt processing as exhibited by improved retention of molecular weight and maintenance of polymer molecular architecture.

A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming an Si-containing resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability because of high rate of etching with fluorine. A film-forming composition, for example, including a polymer of Formula (E1) and a solvent.

##STR00001##

To provide an article with a surface layer, that is excellent in fingerprint stain removability, friction resistance, and adhesion to a protective film of the surface layer.

An article with a surface layer, comprising a base material and a surface layer provided on the surface of the base material and characterized in that the surface layer contains groups having —O— between carbon-carbon atoms of a fluoroalkyl group with two or more carbon atoms, and the normalized F intensity obtained by preparing a glass containing 4.96 mass % of fluorine atoms (IGS G4 Fluoride Opal Glass manufactured by Bureau of Analysed Samples Ltd.) as a standard sample, measuring, by an X-ray fluorescence spectrometer, the fluorine atom intensity in the surface layer and the fluorine atom intensity in the standard sample, respectively, and dividing the fluorine atom intensity in the surface layer by the fluorine atom intensity in the standard sample, is from 0.38 to 0.53.