Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.

Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.

Methods of synthesizing fluorosilanes containing cyano-substituted alkyl groups are provided. For example, 3-cyano-propyldimethylfluorosilane may be produced by reacting tetramethyldisiloxane and boron trifluoride to obtain fluorodimethylsilane and then reacting the fluorodimethylsilane with allyl cyanide, in the presence of a hydrosilylation catalyst

Methods of synthesizing fluorosilanes containing cyano-substituted alkyl groups are provided. For example, 3-cyano-propyldimethylfluorosilane may be produced by reacting tetramethyldisiloxane and boron trifluoride to obtain fluorodimethylsilane and then reacting the fluorodimethylsilane with allyl cyanide, in the presence of a hydrosilylation catalyst

Described is a method for producing alkenyl halosilanes by reacting alkenyl halide selected from the group comprising vinyl halide, vinylidene halide, and allyl halide with halosilane selected from the group comprising monohalosilane, dihalosilane, and trihalosilane in the gas phase in a reactor comprising a reaction tube (1) that has an inlet (2) at one end and an outlet (3) at the other end, said reactor further comprising an annular-gap nozzle (4) that is mounted on the inlet (2), extends into the reaction tube (1), and has a central supply duct (5) for one reactant (7) and a supply duct (6), which surrounds the central supply duct (5), for the other reactant (8). In order to carry out said method, alkenyl halide is injected into the reaction tube (1) through the central supply duct (5), halosilane is injected thereinto through the surrounding supply duct (6), and both substances flow through the reaction tube (1) in the direction of the outlet (3). The described method allows alkenyl halosilanes to be produced at a high yield and with great selectivity. The amount of soot formed is significantly lower than in conventional reactors. The invention also relates to a reactor for carrying out gas-phase reactions, said reactor being characterized by at least the following elements: A) a reaction tube (1) that has B) an inlet (2) at one end, C) an outlet (3) at the other end, and D) an annular-gap nozzle (4) which includes a central supply duct (5) for one reactant (7) and a supply duct (6), which surrounds the central supply duct (5), for another reactant (8), said nozzle being mounted on the inlet (2) and extending into the reaction tube (1).

Described is a method for producing alkenyl halosilanes by reacting alkenyl halide selected from the group comprising vinyl halide, vinylidene halide, and allyl halide with halosilane selected from the group comprising monohalosilane, dihalosilane, and trihalosilane in the gas phase in a reactor comprising a reaction tube (1) that has an inlet (2) at one end and an outlet (3) at the other end, said reactor further comprising an annular-gap nozzle (4) that is mounted on the inlet (2), extends into the reaction tube (1), and has a central supply duct (5) for one reactant (7) and a supply duct (6), which surrounds the central supply duct (5), for the other reactant (8). In order to carry out said method, alkenyl halide is injected into the reaction tube (1) through the central supply duct (5), halosilane is injected thereinto through the surrounding supply duct (6), and both substances flow through the reaction tube (1) in the direction of the outlet (3). The described method allows alkenyl halosilanes to be produced at a high yield and with great selectivity. The amount of soot formed is significantly lower than in conventional reactors. The invention also relates to a reactor for carrying out gas-phase reactions, said reactor being characterized by at least the following elements: A) a reaction tube (1) that has B) an inlet (2) at one end, C) an outlet (3) at the other end, and D) an annular-gap nozzle (4) which includes a central supply duct (5) for one reactant (7) and a supply duct (6), which surrounds the central supply duct (5), for another reactant (8), said nozzle being mounted on the inlet (2) and extending into the reaction tube (1).

The invention relates to a process for the manufacture of organomonosilanes bearing both hydrogen and chlorine substituents at the silicon atom by subjecting a silane substrate comprising one or more silanes selected from organomonosilanes, organodisilanes and organocarbodisilanes, with the proviso that at least one of these silanes has at least one chlorine substituent at the silicon atom, to a redistribution reaction in the presence of a phosphane or amine acting as a redistribution catalyst.

The invention relates to a process for the manufacture of organomonosilanes bearing both hydrogen and chlorine substituents at the silicon atom by subjecting a silane substrate comprising one or more silanes selected from organomonosilanes, organodisilanes and organocarbodisilanes, with the proviso that at least one of these silanes has at least one chlorine substituent at the silicon atom, to a redistribution reaction in the presence of a phosphane or amine acting as a redistribution catalyst.

A halosilane compound: R.sup.1CH.sub.2CH.sub.2SiR.sup.5.sub.2X is prepared by hydrosilylation reaction of a vinyl compound: R.sup.1CH═CH.sub.2 with a halogenodiorganosilane compound having formula: HSiR.sup.5.sub.2X in the co-presence of an iridium catalyst, an internal olefin compound, and an allyl halide. The halosilane compound is prepared on an industrial scale with the advantages of low costs, high yields, and high selectivity, using a small amount of iridium catalyst.

A halosilane compound: R.sup.1CH.sub.2CH.sub.2SiR.sup.5.sub.2X is prepared by hydrosilylation reaction of a vinyl compound: R.sup.1CH═CH.sub.2 with a halogenodiorganosilane compound having formula: HSiR.sup.5.sub.2X in the co-presence of an iridium catalyst, an internal olefin compound, and an allyl halide. The halosilane compound is prepared on an industrial scale with the advantages of low costs, high yields, and high selectivity, using a small amount of iridium catalyst.