A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.

Provided are a photobase generator having higher sensitivity to light than do conventional photobase generators, and a photosensitive resin composition containing the photobase generator. The present invention is a photobase generator characterized in containing a salt represented by general formula (1). (In formula (1), R.sup.1-R.sup.4 are mutually independent groups represented by general formula (2), C1-18 alkyl groups, or Ar, with at least one being a group represented by general formula (2); in formula (2), (D) is a divalent group bonded on at least one side to elemental boron, and Ar.sup.1 is the same as the aforementioned Ar; and Q.sup.+ is a monovalent onium cation.) ##STR00001##

The present invention relates to n-dopants for doping organic electron transport materials, wherein the n-dopants have at least one aminophosphazene group of formula 1 having 4 nitrogen atoms bonded to a phosphorus atom.

##STR00001##

A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.