Patent classifications
C08F12/22
Polymer compound for conductive polymer and method for producing same
A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): ##STR00001## R.sup.1 represents a hydrogen atom or a methyl group; Rf.sub.1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf.sub.1; Z.sub.1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R.sup.2—; R.sup.2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R.sup.2; and “a” is 0<a≤1.0, and ##STR00002## “b” is 0<b<1.0.
Polymer compound for conductive polymer and method for producing same
A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): ##STR00001## R.sup.1 represents a hydrogen atom or a methyl group; Rf.sub.1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf.sub.1; Z.sub.1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R.sup.2—; R.sup.2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R.sup.2; and “a” is 0<a≤1.0, and ##STR00002## “b” is 0<b<1.0.
Dynamic polymers based on silyl ether exchange
The disclosure provides for dynamic polymers based on silyl ether exchange that are malleable and recyclable which have favorable mechanical properties and chemical resistance, methods of making thereof, and uses and applications thereof.
Dynamic polymers based on silyl ether exchange
The disclosure provides for dynamic polymers based on silyl ether exchange that are malleable and recyclable which have favorable mechanical properties and chemical resistance, methods of making thereof, and uses and applications thereof.
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN
A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, represents a polymerizable group-containing group, Ra.sup.01 represents a linear or branched hydrocarbon group, and Ra.sup.02 and Ra.sup.03 each independently represents a hydrocarbon group which may have a substituent
##STR00001##
PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, the photoresist underlayer formed from a composition including a polymer having a glass transition temperature of less than 110° C. and a solvent; subjecting the photoresist underlayer to a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.
PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, the photoresist underlayer formed from a composition including a polymer having a glass transition temperature of less than 110° C. and a solvent; subjecting the photoresist underlayer to a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.
Photosensitive resin composition
Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide: ##STR00001##
where R.sup.1 is a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and R.sup.2 is a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.
Amidation of polymers containing ester side chains using functionalized amines
The invention entails the combination of basic catalysts, specifically guanidine-based catalysts, such as TBD, in conjunction with functionalized amines having a hydrogen bond donating or accepting functionality, to facilitate the accelerated transamidation of polymer compounds with non-activated ester side chains.
Amidation of polymers containing ester side chains using functionalized amines
The invention entails the combination of basic catalysts, specifically guanidine-based catalysts, such as TBD, in conjunction with functionalized amines having a hydrogen bond donating or accepting functionality, to facilitate the accelerated transamidation of polymer compounds with non-activated ester side chains.