Metal-oxide composite particles are used as a toner additive.

Metal-oxide composite particles are used as a toner additive.

Metal-oxide composite particles are used as a toner additive.

The present invention relates to novel fluorine containing polymers, compositions comprising the polymers, the use of the polymers in coatings, especially in water and dirt repellent coatings, and products coated with polymer containing coatings.

A silsesquioxane compound represented by the following formula (I): (R.sup.aSiO.sub.1.5).sub.n, wherein R.sup.a is, each independently at each occurrence, R.sup.b or R.sup.c; provided that at least one R.sup.a is R.sup.b; R.sup.b is R.sup.1CF.sub.2R.sup.2R.sup.3; R.sup.1 is a divalent group; R.sup.2 is a divalent polymer chain; R.sup.3 is a halogen atom or a hydrogen atom; R.sup.c is a hydrogen atom, an alkyl group, a phenyl group, or (OSiR.sup.15.sub.2).sub.jR.sup.15; R.sup.15 is, each independently at each occurrence, a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; j is, each independently at each occurrence, an integer of 1 to 3; and n is an arbitrary integer.

An anti-fogging and anti-fouling laminate, including: a substrate; and an anti-fogging and anti-fouling layer on the substrate where a surface of the anti-fogging and anti-fouling layer is flat, wherein the anti-fogging and anti-fouling layer is a cured product obtained by curing an active energy ray curable resin composition through an active energy ray, wherein the active energy ray curable resin composition includes a hydrophilic monomer having a radically polymerizable unsaturated group and a photopolymerization initiator, wherein a content of the hydrophilic monomer having a radically polymerizable unsaturated group in the active energy ray curable resin composition is 60% by mass or more, and wherein a surface of the anti-fogging and anti-fouling layer has a pure water contact angle of 90 or more.

The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1):

##STR00001##

wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.

The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1):

##STR00001##

wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.

The present invention relates to novel fluorine containing polymers, compositions comprising the polymers, the use of the polymers in coatings, especially in water and dirt repellent coatings, and products coated with polymer containing coatings.

An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (I), A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method,

##STR00001##

in Formula (I), Z represents a halogen atom, a group represented by R.sub.11OCH.sub.2, or a group represented by R.sub.12OC(O)CH.sub.2. R.sub.11 and R.sub.12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.