The present invention relates to a photocurable acrylic resin which is a polymer of a monomer mixture including a crosslinkable monomer represented by [Formula 1]; a (meth)acrylic monomer including a photoinitiating functional group; and an alkyl (meth)acrylate-based monomer, and has a weight average molecular weight of 100,000 to 500,000, and a branch-type polymer structure, and an adhesive composition and an adhesive film including the same.

Provided is a calixarene compound represented by structural formula (1). In structural formula (1), R.sup.1 and R.sup.2 each independently represent a structural moiety (A) having a functional group (I), a structural moiety (B) having a functional group (II) having a carbon-carbon unsaturated bond (excluding maleate groups), a structural moiety (C) having both the functional group (I) and the functional group (II), a monovalent organic group (D) that has 1 to 20 carbon atoms and is other than the structural moieties (A), (B) and (C), or a hydrogen atom (E). At least one of a plurality of R.sup.2s is the structural moiety (A), the structural moiety (B), the structural moiety (C), or the organic group (D).

##STR00001##

Provided is a calixarene compound represented by structural formula (1). In structural formula (1), R.sup.1 and R.sup.2 each independently represent a structural moiety (A) having a functional group (I), a structural moiety (B) having a functional group (II) having a carbon-carbon unsaturated bond (excluding maleate groups), a structural moiety (C) having both the functional group (I) and the functional group (II), a monovalent organic group (D) that has 1 to 20 carbon atoms and is other than the structural moieties (A), (B) and (C), or a hydrogen atom (E). At least one of a plurality of R.sup.2s is the structural moiety (A), the structural moiety (B), the structural moiety (C), or the organic group (D).

##STR00001##

A method of forming a photo-cured layer on a substrate can include applying a first photocurable composition overlying a first region of the substrate and a second photocurable composition overlying a second region of the substrate and photo-curing the applied compositions, wherein the first region is a center region of the substrate and the second region is an edge region of the substrate, and the second photocurable composition has a higher vapor pressure than the first photocurable composition. The method can have the advantage that the forming of an extrusion within the edge region of the photo-cured layer can be avoided or being kept very low.

A method of forming a photo-cured layer on a substrate can include applying a first photocurable composition overlying a first region of the substrate and a second photocurable composition overlying a second region of the substrate and photo-curing the applied compositions, wherein the first region is a center region of the substrate and the second region is an edge region of the substrate, and the second photocurable composition has a higher vapor pressure than the first photocurable composition. The method can have the advantage that the forming of an extrusion within the edge region of the photo-cured layer can be avoided or being kept very low.

A resin composition including a resin R including a repeating unit having a partial structure of Formula (I) or (II):

##STR00001##

where Q.sub.A is an ester bond shown in the Formula (I), R.sub.A is a substituent group, n1 is any of integers 1 to 5, * is a bonding site with a remainder of the repeating unit, and ** is a bonding site with a phenyl group in the Formula (I);

##STR00002##

where Q.sub.B is a linking group or a single bond other than the ester bond of Q.sub.A in Formula (I), R.sub.B is a substituent group, with at least one R.sub.B being a hydroxyl group, n2 is any of integers 1 to 5, and * is a bonding site with a remainder of the repeating unit.

A resin composition including a resin R including a repeating unit having a partial structure of Formula (I) or (II):

##STR00001##

where Q.sub.A is an ester bond shown in the Formula (I), R.sub.A is a substituent group, n1 is any of integers 1 to 5, * is a bonding site with a remainder of the repeating unit, and ** is a bonding site with a phenyl group in the Formula (I);

##STR00002##

where Q.sub.B is a linking group or a single bond other than the ester bond of Q.sub.A in Formula (I), R.sub.B is a substituent group, with at least one R.sub.B being a hydroxyl group, n2 is any of integers 1 to 5, and * is a bonding site with a remainder of the repeating unit.

The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

A quencher is disclosed having a compound represented by the following general formula (1):

##STR00001##

wherein R.sub.5 each independently represent a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an amino group having a substituent or not having a substituent, a hydroxy group, an aryl group, an aryloxy group, or an arylalkyl group; R.sub.6 represents a group having a polymerizable unsaturated group, a hydroxy group, or the like; Y.sub.1 represents an oxygen atom, or the like; An.sup.− represents an anion; Ar.sub.1 represents a specific ring structure; * and ** represent binding positions; Ar.sub.2 represents a benzene ring, a naphthalene ring, or an anthracene ring; n.sub.1 represents a specific integer;
and the following structure (1-10) in the general formula (1) is an asymmetric structure;

##STR00002##

(wherein R.sub.5, Y.sub.1, Ar.sub.1, Ar.sub.2, n.sub.1, * and ** are the same as described above.).