C08F20/30

Liquid crystal film, optical laminate, circularly polarizing plate, and organic electroluminescent display device

The present invention provides a liquid crystal film having an optically anisotropic layer having excellent alignment and excellent adhesiveness. The present invention further provides an optical laminate, a circularly polarizing plate, and an organic EL display device, each of which uses the optically anisotropic layer. The liquid crystal film of an embodiment of the present invention is a liquid crystal film having at least an optically anisotropic layer formed with a liquid crystal composition including a polymerizable liquid crystal compound and a fluoroaliphatic group-containing copolymer, and a support, in which the fluoroaliphatic group-containing copolymer has a repeating unit derived from a fluoroaliphatic group-containing monomer represented by General Formula (1) and a repeating unit having a polymerizable group polymerizable with the polymerizable liquid crystal compound. ##STR00001##

COMPOUND, POLYMERIZABLE COMPOSITION, CURED PRODUCT, OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE

Provided is a compound which is capable of reducing a tilt angle of a liquid crystal molecule, and a polymerizable composition, a cured product, an optical film, a polarizing plate, and an image display device, each using the compound. The compound is represented, for example, by Formula (I), P-Sp-Z-G.sup.1-(X.sup.1-Cy.sup.1)n-(X.sup.2-A.sup.1)m-X.sup.3-A.sup.2.

Compound, resin, resist composition and method for producing resist pattern

Disclosed is a compound represented by formula (I): ##STR00001##
in formula (I), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a methyl group, X.sup.1 and X.sup.2 each independently represent a group represented by any one of formula (X.sup.1−1) to formula (X.sup.1−8): ##STR00002## A.sup.1 and A.sup.2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH.sub.2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O).sub.2—, and R.sup.3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O).sub.2—.

Compound, resin, resist composition and method for producing resist pattern

Disclosed is a compound represented by formula (I): ##STR00001##
in formula (I), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a methyl group, X.sup.1 and X.sup.2 each independently represent a group represented by any one of formula (X.sup.1−1) to formula (X.sup.1−8): ##STR00002## A.sup.1 and A.sup.2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH.sub.2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O).sub.2—, and R.sup.3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O).sub.2—.

Photocurable composition, denture base, and plate denture
11780947 · 2023-10-10 · ·

The present invention provides a photocurable composition for use in stereolithography, the photocurable composition including: a (meth)acrylic monomer (X) that is at least one selected from the group consisting of di(meth)acrylic monomers containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and that has a weight average molecular weight of from 400 to 580; a (meth)acrylic monomer (D) that is at least one selected from the group consisting of (meth)acrylic monomers containing, within one molecule, at least one aromatic ring and one (meth)acryloyloxy group, and that has a weight average molecular weight of from 140 to 350; and a photopolymerization initiator.

Photocurable composition, denture base, and plate denture
11780947 · 2023-10-10 · ·

The present invention provides a photocurable composition for use in stereolithography, the photocurable composition including: a (meth)acrylic monomer (X) that is at least one selected from the group consisting of di(meth)acrylic monomers containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and that has a weight average molecular weight of from 400 to 580; a (meth)acrylic monomer (D) that is at least one selected from the group consisting of (meth)acrylic monomers containing, within one molecule, at least one aromatic ring and one (meth)acryloyloxy group, and that has a weight average molecular weight of from 140 to 350; and a photopolymerization initiator.

METAL-POLYMER HYBRID MATERIALS WITH A HIGH REFRACTIVE INDEX
20230323133 · 2023-10-12 ·

Coatable compositions contain metal-(meth)acrylate hybrid materials that when cured form a metal-polymer hybrid layer with a relatively high refractive index. The curable metal-(meth)acrylate hybrid composition includes a photoinitiator, a polyoxometalate and either a hydroxyl-functional (meth)acrylate or a mixture of hydroxyl-functional (meth)acrylate and aromatic (meth)acrylate. The printable, solvent-free composition, upon curing forms a metal-polymer hybrid layer that is optically transparent and has a refractive index of at least 1.52.

METAL-POLYMER HYBRID MATERIALS WITH A HIGH REFRACTIVE INDEX
20230323133 · 2023-10-12 ·

Coatable compositions contain metal-(meth)acrylate hybrid materials that when cured form a metal-polymer hybrid layer with a relatively high refractive index. The curable metal-(meth)acrylate hybrid composition includes a photoinitiator, a polyoxometalate and either a hydroxyl-functional (meth)acrylate or a mixture of hydroxyl-functional (meth)acrylate and aromatic (meth)acrylate. The printable, solvent-free composition, upon curing forms a metal-polymer hybrid layer that is optically transparent and has a refractive index of at least 1.52.

Polymer for pattern forming material

A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below, ##STR00001##
wherein, R.sup.5 is a hydrogen atom or a methyl group, each R.sup.6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, ##STR00002##
wherein, R.sup.11 is a hydrogen atom or a methyl group, each R.sup.12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.

Polymer for pattern forming material

A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below, ##STR00001##
wherein, R.sup.5 is a hydrogen atom or a methyl group, each R.sup.6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, ##STR00002##
wherein, R.sup.11 is a hydrogen atom or a methyl group, each R.sup.12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.