The present invention relates to a method for the treatment of a suspension of solid particles in water using water-soluble (co)polymers made from the hydrated crystalline form of 2-acrylamido-2-methylpropane sulfonic acid or of at least one of the salts thereof. This method is particularly useful for treating residues resulting from the mining industry.

The present invention relates to a method for the treatment of a suspension of solid particles in water using water-soluble (co)polymers made from the hydrated crystalline form of 2-acrylamido-2-methylpropane sulfonic acid or of at least one of the salts thereof. This method is particularly useful for treating residues resulting from the mining industry.

A photoresist composition, comprising a first polymer comprising a first repeating unit comprising an acid-labile group, and a second polymer comprising a repeating unit derived from one or more monomers of formula (4); a photoacid generator; and a solvent,

##STR00001##

wherein Z.sup.1, Z.sup.2, R.sup.1, R.sup.2, and L are as described herein, and P is a polymerizable group.

A photoresist composition, comprising a first polymer comprising a first repeating unit comprising an acid-labile group, and a second polymer comprising a repeating unit derived from one or more monomers of formula (4); a photoacid generator; and a solvent,

##STR00001##

wherein Z.sup.1, Z.sup.2, R.sup.1, R.sup.2, and L are as described herein, and P is a polymerizable group.

A curable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise a first monomer including at least one bismaleimide-monomer and at least one second monomer. The curable composition can have a viscosity of not greater than 30 mPa.Math.s, and a cured layer of the curable composition can have a high thermal stability up to 350° C.

A curable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise a first monomer including at least one bismaleimide-monomer and at least one second monomer. The curable composition can have a viscosity of not greater than 30 mPa.Math.s, and a cured layer of the curable composition can have a high thermal stability up to 350° C.

The invention relates to a method for the purification of acrylamido-2-methyl-2-propanesulphonic acid comprising the following successive steps:

1) preparation of a suspension of acrylamido-2-methyl-2-propanesulphonic acid crystals by distillation of an aqueous solution of acrylamido-2-methyl-2-propanesulphonic acid in order to obtain a suspension of acrylamido-2-methyl-2-propanesulphonic acid crystals,
2) isolation of the acrylamido-2-methyl-2-propanesulphonic acid crystals generally by solid/liquid separation from said suspension in order to isolate said acrylamido-2-methyl-2-propanesulphonic acid crystals,
characterised in that the distillation step is carried out continuously and at a pressure below atmospheric pressure.

The invention also relates to a polymer obtained from acrylamido-2-methyl-2-propanesulphonic acid crystals or its salts, obtained according to such a method, and to the use of said polymer in oil and gas recovery, in water treatment, in sludge treatment, in manufacturing paper, in construction, in mining, in cosmetic formulation, in detergent formulation, in textile making, or in agriculture.

The invention relates to a method for the purification of acrylamido-2-methyl-2-propanesulphonic acid comprising the following successive steps:

1) preparation of a suspension of acrylamido-2-methyl-2-propanesulphonic acid crystals by distillation of an aqueous solution of acrylamido-2-methyl-2-propanesulphonic acid in order to obtain a suspension of acrylamido-2-methyl-2-propanesulphonic acid crystals,
2) isolation of the acrylamido-2-methyl-2-propanesulphonic acid crystals generally by solid/liquid separation from said suspension in order to isolate said acrylamido-2-methyl-2-propanesulphonic acid crystals,
characterised in that the distillation step is carried out continuously and at a pressure below atmospheric pressure.

The invention also relates to a polymer obtained from acrylamido-2-methyl-2-propanesulphonic acid crystals or its salts, obtained according to such a method, and to the use of said polymer in oil and gas recovery, in water treatment, in sludge treatment, in manufacturing paper, in construction, in mining, in cosmetic formulation, in detergent formulation, in textile making, or in agriculture.

According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a resin P having a repeating unit represented by General Formula (P1) and a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

##STR00001## M.sup.p represents a single bond or a divalent linking group. L.sup.p represents a divalent linking group. X.sup.p represents O, S, or NR.sup.N1. R.sup.N1 represents a hydrogen atom or a monovalent organic group. R.sup.p represents a monovalent organic group.

The present invention relates to a compound according to Formula (3), wherein the compound comprises from 28 wt. % to 100 wt. % bio-based carbon content, relative to the total mass of carbon in the compound, measured according to standard ASTM D6866-12, Method B; ##STR00001## and wherein X.sup.+is a proton. The present invention also relates to a polymer obtained by polymerising at least one of compound according to Formula (3), in addition to processes and uses related thereto.