The purpose of the present invention is to provide: a surface treatment liquid that is capable of favorably hydrophilizing or hydrophobing surfaces of an object to be treated without having to include a film forming resin; and a surface treatment method using the surface treatment liquid. The present invention provides a surface treatment liquid which comprises (A) a resin and (C) a solvent, wherein as (A) the resin, a resin is used which has a weight average molecular weight of 100000 or more and contains a functional group I which comprises one group or more selected from the group consisting of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II which is a hydrophilic group or a hydrophobic group other than the functional group I.

An adhesive composition having excellent adhesiveness to a cycloolefin resin or the like. The adhesive composition of the present invention includes a polymer having a repeating unit derived from a polymerizable compound represented by formula (I): Y—N(Ar)(R) Formula (I), in which Ar represents an unsubstituted or substituted C6 to C14 aryl group or an unsubstituted or substituted C6 to C10 aryl C1 to C3 alkyl group; R represents an unsubstituted or substituted C1 to C6 alkyl group, an unsubstituted or substituted C3 to C6 cycloalkyl group, an unsubstituted or substituted C6 to C14 aryl group, or an unsubstituted or substituted C6 to C10 aryl C1 to C3 alkyl group; and Y represents a polymerizable functional group. In Formula (I), a substituent on Ar and a substituent on R can bond to form a divalent organic group.

An ink set for stereolithography according to the present invention is an ink set for stereolithography to be used in ink-jet stereolithography, and the ink set for stereolithography includes a composition for a support material to be used to shape a support material and a composition for a model material to be used to shape a model material. When the composition for a support material is ejected onto a support material cured article, which is a cured article of the composition for a support material, a contact angle of the composition for a support material with respect to the support material cured article at 0.3 seconds after the composition for a support material hits the support material cured article is taken as a contact angle SS. When the composition for a model material is ejected onto a support material cured article, which is a cured article of the composition for a support material, a contact angle of the composition for a model material with respect to the support material cured article at 0.3 seconds after the composition for a model material hits the support material cured article is taken as a contact angle SM. The contact angle SS and the contact angle SM are 25 degrees or more and 35 degrees or less.

Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.

Provided is a pigment dispersion composition including: a yellow pigment; a polymerizable compound having a solubility parameter (SP value) of 10.00 or greater; and a pigment dispersant having an amine value of 30 mgKOH/g or greater but 100 mgKOH/g or less, wherein a ratio (B/A) of a content (B) of the pigment dispersant to a content (A) of the yellow pigment is 0.10 or greater but 0.80 or less.

A cosmetic includes a component (a) and (b): wherein component (a) is a polyacrylic acid or a salt thereof or poly(2-acrylamido-2-methylpropanesulfonic acid) or a salt thereof that has a weight-average molecular weight of 500,000 to 8,000,000, is linear, and has a thread length of 10 mm or less at room temperature when formed into a 1% by mass solution, wherein the thread length is a distance determined by: bringing a round disk having a diameter of about 1 cm uniformly and lightly into contact with a surface of the solution; lowering a container that contains the solution at a velocity of 5 mm/sec, and measuring the distance that the container descended until a thread of the solution is cut, and component (b) is a crosslinked water-swellable polymer having a crosslinking density of 0.01 to 1% by mole, or a microgel obtained by pulverizing a gel consisting of a hydrophilic compound having gelating ability.

A cleaning solution that is used, inter alia, for removal of residue of a photoresist pattern or etching residue, and has exceptional anticorrosion properties with respect to silicon nitride; and a method for cleaning a substrate using the cleaning solution. In a cleaning solution containing a hydrofluoric acid and a solvent, a polymer that includes units derived from a compound of a specific structure having a carboxylic acid amide bond (CON<) and an unsaturated double bond is blended as an anticorrosive agent. Polyvinylpyrrolidone is preferred as the polymer used as the anticorrosive agent.

An active-energy-ray-curable composition including a pigment, a polymerizable compound, and a pigment-adsorptive component is provided. The pigment is at least one selected from the group consisting of strontium titanate, calcium titanate, zinc sulfide, and zinc oxide. The polymerizable compound contains an acrylamide compound (A1) having a specific ester structure.

The presently claimed invention relates to novel monomers which can be used for preparing polymers which are useful as dispersants for pigments and fillers, as wetting agent and as thickening agents in liquid compositions.

Provided is a zwitterionic polymer that has a zwitterion that includes an effect of improving the stability of proteins. This zwitterionic polymer is a polymeric protein stabilizer that exhibits a protein stabilizing effect even at a small addition amount of addition, and at the same time has an antioxidant capability. Also provided is a method for producing this zwitterionic polymer. This problem is solved by a zwitterionic polymer containing a repeating unit represented by formula (1) and having a number-average molecular weight of 1,000 to 1,000,000. On formula (1), R.sup.1 and R.sup.2 are each independently selected from a hydrogen atom; linear, branched or cyclic alkyl groups having 1 to 6 carbons; aromatic groups having 6 to 20 carbons; or alkylene groups having 1 to 6 carbons and formed by linking R.sup.1 to R.sup.2. R.sup.3 represents a hydrogen atom or a methyl group).