A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

A liquid resin composition comprising: a first proportion of acryloyl morpholine monomers; a second proportion of a photoinitiator exhibiting photodissociation into reactive subspecies responsive to selective exposure to radiation within a spectrum, the reactive subspecies polymerizing the first proportion of acryloyl morpholine; a third proportion of a radiation blocker absorbing radiation within the spectrum to limit penetration depth of incident radiation within the spectrum in the liquid resin; a fourth proportion of a polymerization inhibitor limiting an average chain length of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers; and a fifth proportion of a temperature-stabilizer increasing the heat-deflection temperature of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers.

A liquid resin composition comprising: a first proportion of acryloyl morpholine monomers; a second proportion of a photoinitiator exhibiting photodissociation into reactive subspecies responsive to selective exposure to radiation within a spectrum, the reactive subspecies polymerizing the first proportion of acryloyl morpholine; a third proportion of a radiation blocker absorbing radiation within the spectrum to limit penetration depth of incident radiation within the spectrum in the liquid resin; a fourth proportion of a polymerization inhibitor limiting an average chain length of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers; and a fifth proportion of a temperature-stabilizer increasing the heat-deflection temperature of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers.

A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

An object of the present invention is to provide a conductive polymer composite which has good filterability and good film forming property by spin coating and, when a film is formed, can form a conductive film having high transparency and good flatness property. It is provided a conductive polymer composite comprising (A) a -conjugated polymer, and (B) a dopant polymer containing a repeating unit a represented by the following general formula (1), and having a weight average molecular weight in the range of 1,000 to 500,000:

##STR00001## wherein, R.sup.1, Z.sub.1, Rf.sub.1, and a are as defined in the specification.

An object of the present invention is to provide a conductive polymer composite which has good filterability and good film forming property by spin coating and, when a film is formed, can form a conductive film having high transparency and good flatness property. It is provided a conductive polymer composite comprising (A) a -conjugated polymer, and (B) a dopant polymer containing a repeating unit a represented by the following general formula (1), and having a weight average molecular weight in the range of 1,000 to 500,000:

##STR00001## wherein, R.sup.1, Z.sub.1, Rf.sub.1, and a are as defined in the specification.

Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): ##STR00001##
wherein: R.sub.1 represents H, F, methyl or fluorinated methyl; R.sub.2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R.sub.3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R.sub.4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR.sub.5, wherein R.sub.5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.

Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I):

##STR00001##

wherein: R.sub.1 represents H, F, methyl or fluorinated methyl; R.sub.2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R.sub.3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R.sub.4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR.sub.5, wherein R.sub.5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.