C08F212/22

STYRENE DERIVATIVE AND PREPARATION METHOD THEREOF, AND MODIFIED ORGANIC SILICONE RESIN AND PREPARATION METHOD AND USE THEREOF
20230025924 · 2023-01-26 ·

The present disclosure provides a styrene derivative and a preparation method thereof, and a modified organic silicone resin and a preparation method and use thereof, and belongs to the technical field of back coating solutions. The styrene derivative is specifically 2,3-difluoro-4-methoxystyrene. A fluorine atom is introduced into a benzene ring structure, and the obtained styrene derivative contains a C—F bond with a relatively high chemical bond energy, such that the styrene derivative has a relatively high thermal stability. The styrene derivative can be introduced into an organic silicone resin to make the obtained modified organic silicone resin have a higher thermal stability. The modified organic silicone resin can be used as a back coating solution to effectively improve a heat resistance of barcode thermal transfer ribbons.

STYRENE DERIVATIVE AND PREPARATION METHOD THEREOF, AND MODIFIED ORGANIC SILICONE RESIN AND PREPARATION METHOD AND USE THEREOF
20230025924 · 2023-01-26 ·

The present disclosure provides a styrene derivative and a preparation method thereof, and a modified organic silicone resin and a preparation method and use thereof, and belongs to the technical field of back coating solutions. The styrene derivative is specifically 2,3-difluoro-4-methoxystyrene. A fluorine atom is introduced into a benzene ring structure, and the obtained styrene derivative contains a C—F bond with a relatively high chemical bond energy, such that the styrene derivative has a relatively high thermal stability. The styrene derivative can be introduced into an organic silicone resin to make the obtained modified organic silicone resin have a higher thermal stability. The modified organic silicone resin can be used as a back coating solution to effectively improve a heat resistance of barcode thermal transfer ribbons.

ELECTROSTATIC LATENT IMAGE DEVELOPING TONER AND PRODUCTION METHOD OF ELECTROSTATIC LATENT IMAGE DEVELOPING TONER
20230025040 · 2023-01-26 ·

An electrostatic latent image developing toner includes toner base particles including a binding resin and a colorant. The binding resin is at least one of: a first polymer having a first structural unit represented by a general formula (1) below and a second polymer having a second structural unit represented by a general formula (2) below; and a copolymer having at least one of the first structural unit and the second structural unit.

##STR00001##

In the general formula (1), R.sub.1 represents a hydrogen atom or an alkoxy group having one to three carbon atoms.

##STR00002##

In the general formula (2), R.sub.2 represents a hydrogen atom or an alkyl group having one to three carbon atoms.

ELECTROSTATIC LATENT IMAGE DEVELOPING TONER AND PRODUCTION METHOD OF ELECTROSTATIC LATENT IMAGE DEVELOPING TONER
20230025040 · 2023-01-26 ·

An electrostatic latent image developing toner includes toner base particles including a binding resin and a colorant. The binding resin is at least one of: a first polymer having a first structural unit represented by a general formula (1) below and a second polymer having a second structural unit represented by a general formula (2) below; and a copolymer having at least one of the first structural unit and the second structural unit.

##STR00001##

In the general formula (1), R.sub.1 represents a hydrogen atom or an alkoxy group having one to three carbon atoms.

##STR00002##

In the general formula (2), R.sub.2 represents a hydrogen atom or an alkyl group having one to three carbon atoms.

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
20230229082 · 2023-07-20 · ·

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2). R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

##STR00001##

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
20230229082 · 2023-07-20 · ·

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2). R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

##STR00001##

Functionalized resin having a polar linker

Polar silane linkers are provided that attach to resins to form silane-functionalized resins. The functionalized resins can be bound to hydroxyl groups on the surface of silica particles to improve the dispersibility of the silica particles in rubber mixtures. Further disclosed are synthetic routes to provide the silane-functionalized resins, as well as various uses and end products that benefit from the unexpected properties of the silane-functionalized resins. Silane-functionalized resins impart remarkable properties on various rubber compositions, such as tires, belts, hoses, brakes, and the like. Automobile tires incorporating the silane-functionalized resins are shown to possess excellent results in balancing the properties of rolling resistance, tire wear, and wet braking performance.

Functionalized resin having a polar linker

Polar silane linkers are provided that attach to resins to form silane-functionalized resins. The functionalized resins can be bound to hydroxyl groups on the surface of silica particles to improve the dispersibility of the silica particles in rubber mixtures. Further disclosed are synthetic routes to provide the silane-functionalized resins, as well as various uses and end products that benefit from the unexpected properties of the silane-functionalized resins. Silane-functionalized resins impart remarkable properties on various rubber compositions, such as tires, belts, hoses, brakes, and the like. Automobile tires incorporating the silane-functionalized resins are shown to possess excellent results in balancing the properties of rolling resistance, tire wear, and wet braking performance.

Resist composition and method of forming resist pattern

A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the α-position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group ##STR00001##

Resist composition and method of forming resist pattern

A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the α-position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group ##STR00001##