The present invention provides a resist composition containing a base resin composed of a polymer compound having a repeating unit in which a hydrogen atom of a carboxyl group is substituted with one or more acid-labile groups selected from groups shown by the following general formulae (1-1) to (1-5), ##STR00001##
wherein R.sup.1 to R.sup.5 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or an alkynyl group having 2 to 4 carbon atoms; R.sup.6 represents a hydroxyl group or an alkoxy group or acyloxy group having 1 to 6 carbon atoms; and m represents 1 or 2. There can be provided a resist composition that can improve the dissolution contrast of a resist film and reduce the film shrinkage after PEB, and a patterning process using the same.

Provided is a monomer composition that has rapid curability and can be cured rapidly, even in the presence of oxygen and/or water, to form a cured product having excellent adhesion to a wide variety of substrates. The monomer composition according to the present invention contains a vinyl ether compound (A). The vinyl ether compound (A) includes a vinyl ether compound (a) having a cyclic ether skeleton. The monomer composition further contains at least one compound selected from the group consisting of a vinyl ether compound (a) having a chain hydrocarbon skeleton, a divinyl ether compound (a-1) having a cyclic hydrocarbon skeleton, an oxetane compound (B), and an epoxy compound (C).

Provided is a monomer composition that has rapid curability and can be cured rapidly, even in the presence of oxygen and/or water, to form a cured product having excellent adhesion to a wide variety of substrates. The monomer composition according to the present invention contains a vinyl ether compound (A). The vinyl ether compound (A) includes a vinyl ether compound (a) having a cyclic ether skeleton. The monomer composition further contains at least one compound selected from the group consisting of a vinyl ether compound (a) having a chain hydrocarbon skeleton, a divinyl ether compound (a-1) having a cyclic hydrocarbon skeleton, an oxetane compound (B), and an epoxy compound (C).

Provided is a monomer composition that has rapid curability and can be rapidly cured even in the presence of oxygen and/or water, to form a cured product having excellent adhesion to a wide variety of substrates. The monomer composition according to the present invention includes vinyl ether compounds (A). The monomer composition contains a monofunctional monomer in an amount of 20 to 80 weight percent, a hydroxy-free multifunctional vinyl ether compound in an amount of 5 to 80 weight percent, and a hydroxy-containing vinyl ether compound in an amount of 0.1 weight percent to less than 10 weight percent, where all weight percentages are based on the total weight of the monomer composition.

Provided is a monomer composition that has rapid curability and can be rapidly cured even in the presence of oxygen and/or water, to form a cured product having excellent adhesion to a wide variety of substrates. The monomer composition according to the present invention includes vinyl ether compounds (A). The monomer composition contains a monofunctional monomer in an amount of 20 to 80 weight percent, a hydroxy-free multifunctional vinyl ether compound in an amount of 5 to 80 weight percent, and a hydroxy-containing vinyl ether compound in an amount of 0.1 weight percent to less than 10 weight percent, where all weight percentages are based on the total weight of the monomer composition.

A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R.sup.1 to R.sup.4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R.sup.1 to R.sup.4 has the fluorine atom or a group including the fluorine atom. R.sup.5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

##STR00001##

Provided is a method for producing a fluoropolymer in the presence of a specific non-fluorinated compound having surface activity. The method shows a high polymerization rate, and suppresses formation of sticking polymerization materials after production of a polymer product. The method includes aqueous dispersion polymerization of a fluoroolefin in the presence of a compound (1) represented by formula (1): ##STR00001## wherein R.sup.1 and R.sup.2 are the same as or different from each other, and each represent a C4 to C12 non-fluorinated saturated hydrocarbon group; and M is an alkali metal, an ammonium salt, or an amine salt.

Provided is a method for producing a fluoropolymer in the presence of a specific non-fluorinated compound having surface activity. The method shows a high polymerization rate, and suppresses formation of sticking polymerization materials after production of a polymer product. The method includes aqueous dispersion polymerization of a fluoroolefin in the presence of a compound (1) represented by formula (1): ##STR00001## wherein R.sup.1 and R.sup.2 are the same as or different from each other, and each represent a C4 to C12 non-fluorinated saturated hydrocarbon group; and M is an alkali metal, an ammonium salt, or an amine salt.

The present invention provides a resist composition containing a base resin composed of a polymer compound having a repeating unit in which a hydrogen atom of a carboxyl group is substituted with one or more acid-labile groups selected from groups shown by the following general formulae (1-1) to (1-5),

##STR00001##

wherein R.sup.1 to R.sup.5 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, or an alkynyl group having 2 to 4 carbon atoms; R.sup.6 represents a hydroxyl group or an alkoxy group or acyloxy group having 1 to 6 carbon atoms; and m represents 1 or 2. There can be provided a resist composition that can improve the dissolution contrast of a resist film and reduce the film shrinkage after PEB, and a patterning process using the same.

The present invention provides a cationically curable resin composition for assembling hard disk devices which comprises a resin having a cationically polymerizable functional group (a component A) and a cationic polymerization initiator (a component B), the component B being at least one selected from the group consisting of X.sup.+(SbF.sub.6).sup.(B1), X.sup.+(B(C.sub.6F.sub.5).sub.4).sup.(B2) and X.sup.+((Rf).sub.nPF.sub.6-n).sup.(B3) (in the formulae, X.sup.+ is iodonium or sulfonium, Rf is a fluorinated alkyl having 1 to 6 carbon atoms, and n is an integer of 1 to 6). The invention also provides a hard disk device manufacturing method using the composition, and a hard disk device assembled with the composition.