The present invention provides an energy ray-curable coating material for three-dimensional shaped articles that provides excellent toughness in the cured product, and an energy ray-curable material kit for three-dimensional shaping including the coating material. The present invention relates to an energy ray-curable coating material (A) for three-dimensional shaped articles, comprising a polymerizable compound and a polymerization initiator (c), the polymerizable compound comprising a monofunctional polymerizable compound (a), and/or a polyfunctional polymerizable compound (b) having two or more polymerizable groups per molecule, the polyfunctional polymerizable compound (b) having a Mw/n of 120 or more, where Mw is a molecular weight of the polyfunctional polymerizable compound (b), and n is the number of polymerizable groups per molecule.

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air, generates no by-product and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate. The present invention provides a material for forming an organic film, including: (A) a compound for forming an organic film shown by the following general formula (1A) or (1B); and (B) an organic solvent, ##STR00001##
noting that in the general formula (1A), when W.sub.1 represents any of ##STR00002##
R.sub.1 does not represent any of ##STR00003##

An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air, generates no by-product and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate. The present invention provides a material for forming an organic film, including: (A) a compound for forming an organic film shown by the following general formula (1A) or (1B); and (B) an organic solvent, ##STR00001##
noting that in the general formula (1A), when W.sub.1 represents any of ##STR00002##
R.sub.1 does not represent any of ##STR00003##

An object of the invention is to provide a photo-alignment copolymer capable of improving upper layer coatability after layer formation, a binder composition, a binder layer, an optical laminate, and an image display device. A photo-alignment copolymer according to the embodiment of the invention has a repeating unit A including a photo-alignment group, a repeating unit B including a crosslinkable group which causes a crosslinking reaction by the action of at least one selected from the group consisting of light, heat, an acid, and a base, and a repeating unit C including a cleaving group which decomposes by the action of at least one selected from the group consisting of light, heat, an acid, and a base to produce a polar group, and the repeating unit C has the cleaving group on a side chain, and has a group of atoms which is provided on a side closer to a terminal than the cleaving group on the side chain to be able to unevenly distribute the photo-alignment copolymer on an air interface side.

An object of the invention is to provide a photo-alignment copolymer capable of improving upper layer coatability after layer formation, a binder composition, a binder layer, an optical laminate, and an image display device. A photo-alignment copolymer according to the embodiment of the invention has a repeating unit A including a photo-alignment group, a repeating unit B including a crosslinkable group which causes a crosslinking reaction by the action of at least one selected from the group consisting of light, heat, an acid, and a base, and a repeating unit C including a cleaving group which decomposes by the action of at least one selected from the group consisting of light, heat, an acid, and a base to produce a polar group, and the repeating unit C has the cleaving group on a side chain, and has a group of atoms which is provided on a side closer to a terminal than the cleaving group on the side chain to be able to unevenly distribute the photo-alignment copolymer on an air interface side.

A fluorine-containing resin particle contains 0 or more and 30 or less carboxyl groups per 10.sup.6 carbon atoms and 0 ppm or more and 3 ppm or less of a basic compound.

A fluorine-containing resin particle contains 0 or more and 30 or less carboxyl groups per 10.sup.6 carbon atoms and 0 ppm or more and 3 ppm or less of a basic compound.

A dispersion containing a fluorine-containing polymer and a liquid medium. The fluorine-containing polymer includes a repeating unit derived from a fluorine-containing monomer (a) having a Q value of 2.0 or more and comprising a fluoroalkyl group, and a repeating unit derived from a chloride monomer (b) that is at least one selected from vinyl chloride and vinylidene chloride. Further, the dispersion has a concentration of unreacted chloride monomer (b) of 2.0 ppm or less.

A dispersion containing a fluorine-containing polymer and a liquid medium. The fluorine-containing polymer includes a repeating unit derived from a fluorine-containing monomer (a) having a Q value of 2.0 or more and comprising a fluoroalkyl group, and a repeating unit derived from a chloride monomer (b) that is at least one selected from vinyl chloride and vinylidene chloride. Further, the dispersion has a concentration of unreacted chloride monomer (b) of 2.0 ppm or less.