C08F220/30

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##

Polymerizable composition and optically anisotropic body using same

A polymerizable composition containing: a) a polymerizable compound having one or two or more polymerizable groups and satisfying formula (I): Re(450 nm)/Re(550 nm)<1.0 (I); b) at least one photopolymerization initiator selected from the group consisting of alkylphenone-based compounds, acylphosphine oxide-based compounds, and oxime ester-based compounds; and c) a polymerization inhibitor. An optically anisotropic body, a retardation film, an antireflective film, and a liquid crystal display device that are produced using the polymerizable liquid crystal composition. The polymerizable composition is excellent in solubility and has high storage stability, so that no precipitation of crystals etc. occurs. When a film-shaped polymer is produced by polymerizing the above composition, the unevenness of the surface of the coating film is small while the alignment of the liquid crystal is maintained, and high durability is obtained. Therefore, the polymerizable composition is useful.

Multilayer adhesive tape

A multilayer adhesive tape is provided, including: a first outer adhesive layer; an intermediate adhesive layer; and a second outer adhesive layer sequentially. At least one of the first outer adhesive layer and the second outer adhesive layer includes a cured product of an outer adhesive composition including a high molecular weight prepolymer having a weight average molecular weight of 100,000 g/mol or more and 1,500,000 g/mol or less and a low molecular weight prepolymer having a weight average molecular weight of 1,000 g/mol or more and 80,000 g/mol or less.

Multilayer adhesive tape

A multilayer adhesive tape is provided, including: a first outer adhesive layer; an intermediate adhesive layer; and a second outer adhesive layer sequentially. At least one of the first outer adhesive layer and the second outer adhesive layer includes a cured product of an outer adhesive composition including a high molecular weight prepolymer having a weight average molecular weight of 100,000 g/mol or more and 1,500,000 g/mol or less and a low molecular weight prepolymer having a weight average molecular weight of 1,000 g/mol or more and 80,000 g/mol or less.

Multilayer adhesive tape

A multilayer adhesive tape is provided, including: a first outer adhesive layer; an intermediate adhesive layer; and a second outer adhesive layer sequentially. At least one of the first outer adhesive layer and the second outer adhesive layer includes a cured product of an outer adhesive composition including a high molecular weight prepolymer having a weight average molecular weight of 100,000 g/mol or more and 1,500,000 g/mol or less and a low molecular weight prepolymer having a weight average molecular weight of 1,000 g/mol or more and 80,000 g/mol or less.

Liquid crystal composition, method for producing high-molecular weight liquid crystal compound, light absorption anisotropic film, laminate, and image display device
11697770 · 2023-07-11 · ·

The present invention provides a liquid crystal composition with which a light absorption anisotropic film excellent in plane shape uniformity with a high alignment degree can be formed, a method of producing same, a light absorption anisotropic film, a laminate, and an image display device. The liquid crystal composition contains a high-molecular weight liquid crystal compound, and a dichroic substance, where the composition is a copolymer containing 90% by mass or more of a repeating unit (1) of Formula (1) and 10% by mass or less of a repeating unit (2) of Formula (2). In Formulae (1) and (2), P1 to P3 represent main chains, L1 to L3 represent a single bond or divalent linking group, P2 to SP3 represent a single bond or spacer group (SP1), M1 to M3 represent mesogenic groups, T1 represents a terminal group, and n and m are integers of 0 or 1. ##STR00001##

Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

Compound, resin, resist composition and method for producing resist pattern

Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: ##STR00001## wherein R.sup.1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A.sup.1 represents a single bond or *-A.sup.2-CO—O—; A.sup.2 and A.sup.3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R.sup.2 and R.sup.3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R.sup.4 represents a hydrogen atom, —CH.sub.2— in the group may be replaced by —O—, —S—, etc., R.sup.2 and R.sup.3, or R.sup.2, R.sup.3 and R.sup.4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.

Photo-alignment copolymer, binder composition, binder layer, optical laminate, and image display device

An object of the invention is to provide a photo-alignment copolymer capable of improving upper layer coatability after layer formation, a binder composition, a binder layer, an optical laminate, and an image display device. A photo-alignment copolymer according to the embodiment of the invention has a repeating unit A including a photo-alignment group, a repeating unit B including a crosslinkable group which causes a crosslinking reaction by the action of at least one selected from the group consisting of light, heat, an acid, and a base, and a repeating unit C including a cleaving group which decomposes by the action of at least one selected from the group consisting of light, heat, an acid, and a base to produce a polar group, and the repeating unit C has the cleaving group on a side chain, and has a group of atoms which is provided on a side closer to a terminal than the cleaving group on the side chain to be able to unevenly distribute the photo-alignment copolymer on an air interface side.

Resist composition and method of forming resist pattern

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W.sup.1 represents a polymerizable group-containing group, C.sup.t represents a tertiary carbon atom, R.sup.11 represents an unsaturated hydrocarbon group which may have a substituent, R.sup.12 and R.sup.13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an α-position of C.sup.t constitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), W.sup.2 represents a polymerizable group-containing group, Wa.sup.2 represents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3 ##STR00001##